Fine Line Lithography PDF Download

Author: R Newman
Publisher: Elsevier
ISBN: 0444601287
Category : Science
Languages : en
Pages : 492

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Book Description
Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.

Author: R.A. Levy
Publisher: Springer Science & Business Media
ISBN: 9400909179
Category : Technology & Engineering
Languages : en
Pages : 992

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Book Description
The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Author: W. T. Wilkinson
Publisher: New York, E. L. Wilson
ISBN:
Category : Collotype
Languages : en
Pages : 204

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Book Description

Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503

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Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Author: S. Mahajan
Publisher: Elsevier
ISBN: 1483286576
Category : Technology & Engineering
Languages : en
Pages : 607

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Book Description
The development of electronic materials and particularly advances in semiconductor technology have played a central role in the electronics revolution by allowing the production of increasingly cheap and powerful computing equipment and advanced telecommunications devices. This Concise Encyclopedia, which incorporates relevant articles from the acclaimed Encyclopedia of Materials Science and Engineering as well as newly commissioned articles, emphasizes the materials aspects of semiconductors and the technologies important in solid-state electronics. Growth of bulk crystals and epitaxial layers are discussed in the volume and coverage is included of defects and their effects on device behavior. Metallization and passivation issues are also covered. Over 100 alphabetically arranged articles, written by world experts in the field, are each intended to serve as the first source of information on a particular aspect of electronic materials. The volume is extensively illustrated with photographs, diagrams and tables. A bibliography is provided at the end of each article to guide the reader to recent literature. A comprehensive system of cross-references, a three-level subject index and an alphabetical list of articles are included to aid readers in the abstraction of information.

Author: S Radhakrishna
Publisher: World Scientific
ISBN: 9813201649
Category : Science
Languages : en
Pages : 544

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Book Description
This volume compiles the papers presented at the conference which cover the various facets of semiconductor research with emphasis on microelectronics, VLSI and special aspects related to semiconductor applications. There are four sections: Microelectronics; Materials; Photovoltaics; and Gallium Arsenide Devices.

Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446

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Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Author: W. Dietze
Publisher: Springer Science & Business Media
ISBN: 9783540114741
Category : Science
Languages : en
Pages : 680

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Book Description

Author:
Publisher: Academic Press
ISBN: 0080860222
Category : Science
Languages : en
Pages : 325

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Book Description
This volume is for practitioners, experimentalists, and graduate students in applied physics, particularly in the fields of atomic and molecular physics, who work with vacuum ultraviolet applications and are in need of choosing the best type of modern instrumentation. It provides first-hand knowledge of the state-of-the-art equipment sources and gives technical information on how to use it, along with a broad reference bibliography.

Author: James A. Samson
Publisher: Academic Press
ISBN: 0080543480
Category : Science
Languages : en
Pages : 317

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Book Description
Techniques of Vacuum Ultraviolet Spectroscopy was first published in 1967. In the three decades since, the techniques associated with vacuum ultraviolet spectroscopy have been greatly expanded. Originally published as two volumes in the serial "Experimental Methods in the Physical Sciences," Vacuum Ultraviolet Spectroscopy combines in one paperback volume information on the many advances in vacuum ultraviolet (VUV) research. In addition, the book provides students and researchers with concise reviews of the important aspects of designing experiments in the VUV region.This is the only comprehensive treatise describing the use of synchrotron and other light sources for research, along with the new technologies in optical elements, multilayers, mirror coatings, soft x-ray zone plates, VUV detectors, interferometric spectrometers, and subjects such as spectromicroscopy, lithography, and photon-induced fluorescence. Vacuum Ultraviolet Spectroscopy is an ideal handbook both for the beginner and for the experienced researcher in any field requiring the use of VUV radiation. Key Features* Detailed review of synchrotron radiation sources including undulators and wigglers* Comprehensive outline of monochromator design* Concise review of optics theory for multilayers, spectrometers, and zone plates* Information about other important VUV sources such as laser produced plasmas and Electron Beam Ion Trap (EBIT) sources* Applications such as spectromicroscopy, lithography, and fluorescence