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Author: John Michael Szilagyi Publisher: ISBN: Category : Extreme ultraviolet lithography Languages : en Pages : 76
Book Description
The recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUV's high absorption has limited the number of imaging options due to the many atomic resonances in this spectrum. Currently EUV is imaged with photodiodes and X-ray CCDs. However photodiodes are limited in that they can only resolve intensity with respect to time and X-ray CCDs are limited to temporal resolution in the microsecond range. This work shows a novel approach to imaging EUV light over a nanosecond time scale, by using an EUV scintillator to convert EUV to visible light imaged by a conventional streak camera. A laser produced plasma, using a mass-limited tin based target, provided EUV light which was imaged by a grazing incidence flat field spectrometer onto a Ce:YAG scintillator. The EUV spectrum (5 nm-20 nm) provided by the spectrometer is filter by a zirconium filter and then converted by the scintillator to visible light (550 nm) which can then be imaged with conventional optics. Visible light was imaged by an electron image tube based streak camera. The streak camera converts the visible light image to an electron image using a photocathode, and sweeps the image across a recording medium. The streak camera also provides amplification and gating of the image by the means of a micro channel plate, within the image tube, to compensate for low EUV intensities. The system provides 42 ns streaked images of light with a temporal resolution of 440 ps at a repetition rate of 1 Hz. Upon calibration the EUV streak camera developed in this work will be used in future EUV development.
Author: John Michael Szilagyi Publisher: ISBN: Category : Extreme ultraviolet lithography Languages : en Pages : 76
Book Description
The recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUV's high absorption has limited the number of imaging options due to the many atomic resonances in this spectrum. Currently EUV is imaged with photodiodes and X-ray CCDs. However photodiodes are limited in that they can only resolve intensity with respect to time and X-ray CCDs are limited to temporal resolution in the microsecond range. This work shows a novel approach to imaging EUV light over a nanosecond time scale, by using an EUV scintillator to convert EUV to visible light imaged by a conventional streak camera. A laser produced plasma, using a mass-limited tin based target, provided EUV light which was imaged by a grazing incidence flat field spectrometer onto a Ce:YAG scintillator. The EUV spectrum (5 nm-20 nm) provided by the spectrometer is filter by a zirconium filter and then converted by the scintillator to visible light (550 nm) which can then be imaged with conventional optics. Visible light was imaged by an electron image tube based streak camera. The streak camera converts the visible light image to an electron image using a photocathode, and sweeps the image across a recording medium. The streak camera also provides amplification and gating of the image by the means of a micro channel plate, within the image tube, to compensate for low EUV intensities. The system provides 42 ns streaked images of light with a temporal resolution of 440 ps at a repetition rate of 1 Hz. Upon calibration the EUV streak camera developed in this work will be used in future EUV development.
Author: David Attwood Publisher: Cambridge University Press ISBN: 1139643428 Category : Technology & Engineering Languages : en Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author: David Attwood Publisher: Cambridge University Press ISBN: 1316810666 Category : Technology & Engineering Languages : en Pages :
Book Description
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.
Author: Federico Canova Publisher: Springer ISBN: 3662474433 Category : Science Languages : en Pages : 205
Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author: Publisher: ISBN: Category : Languages : en Pages :
Book Description
The first part of this thesis describes our novel design, test, and application of our X-ray streak camera to the pulse duration measurement of soft X-rays. We demonstrated a significant improvement in the resolution of the x-ray streak camera by reducing the electron beam size in the deflection plates. This was accomplished by adding a slit in front of the focusing lens and the deflection plates. The temporal resolution reached 280 fs when the slit width was 5 [Mu]m. The camera was operated in an accumulative mode and tested by using a 25 fs laser with 2 kHz repetition rate and 1-2% RMS pulse energy stability. We conclude that deflection aberrations, which limit the resolution of the camera, can be appreciably reduced by eliminating the wide-angle electrons. We also employed the same streak camera to demonstrate that it is capable of measuring the pulse duration of X-rays. We measured the pulse duration of X-rays emitted from Ni-like Ag and Cd grazing-incidence laser to be ~5ps. The measured value agrees with the prediction made by the model and the measurement made by changing the delay as a function of the pulse duration. The streak camera was also tested with various sources of X-ray such as high harmonics generation of soft x-rays from an argon atom using a high power Ti:sapphire laser source of KLS. The result of the measurement manifests its capability for serving as a detector in the study of ultrafast dynamics in the field of physics, chemistry, biology and medical sciences. The second part of this thesis describes our design of a spectrometer to study the effect of the Carrier envelope (CE) phase on polarization gated extreme-ultraviolet (XUV) super-continuum generation. Because the challenge of making single shot experiment possible is to generate a sufficient number of photons, our setup has been built to allow generation of high order harmonics at the maximum phase matched pressure. This is the first time to our knowledge that phase matching in the polarization gating process has been studied so far. We measured the maximum phase matching pressure to be ~ 55 Torr which is the pressure above which quadratic increase in intensity of the high harmonics spectrum ceases to appear. At this pressure the number of photons per laser shot was 104 which is sufficient for measuring the single shot XUV spectrum in the range 34 to 45 eV. The spectral profile was a super-continuum for some shots and discrete high harmonics for other shots. It is believed that the shot to shot variation of the spectra is due to the changes of the carrier envelope phase of the few-cycle laser pulses used for the polarization gating. An improved CE phase stabilization system in KLS further eliminated the statistical noise in our observation by allowing us to integrate data over several laser cycles for each CE phase value. The effect of CE phase on a polarization gated XUV spectrum was tested by changing the CE phase with two different methods. In the first method, the CE phase was changed by changing the thickness of fused silica plates on the beam path, and the result shows the shift in the spectral peak of the XUV when the gate width approached less than one optical cycle. As gate width was made less than half the optical cycle, the spectrum was observed with continuum harmonics separated by [Pi] radians. We believe that the presence of continuum and discrete harmonics spectra in the observation is due to single and double attosecond pulses generated in the polarization gating. In the second method the carrier-envelope phase of pulses from a grating-based chirped pulse amplification laser was varied smoothly to cover a 2[Pi] range by controlling the grating separation. The phase is measured simultaneously by an f-to-2f setup and by the variation of XUV spectra from polarization gated high harmonic generation. A very good similarity between the effect of single and double slits in Yong's experiment and that of CE phase on the XUV spectrum in the polarization gating experiment has been found, giving better agreement with the theory. The effect of optical properties such as the Gouy phase shift on the polarization gated spectrum has also been studied in the course of investigating the best experimental optimizations to generate the most CE phase sensitive XUV spectrum with less statistical noise. This is the first time to our knowledge experimental study of the effect of the Gouy phase shift on a polarization gated XUV spectrum has been made.
Author: John Michael Szilagyi
Author: John Michael Szilagyi
Author: Allan Johansson
Author: Stephen Ernest Harris
Author: David Attwood
Author: Thomas J. McIlrath
Author: David Attwood
Author: Federico Canova
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