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Author: Tsutomu Miki Publisher: World Scientific ISBN: 9812810250 Category : Computers Languages : en Pages : 245
Book Description
The human brain, the ultimate intelligent processor, can handle ambiguous and uncertain information adequately. The implementation of such a human-brain architecture and function is called OC brainwareOCO. Brainware is a candidate for the new tool that will realize a human-friendly computer society. As one of the LSI implementations of brainware, a OC bio-inspiredOCO hardware system is discussed in this book. Consisting of eight enriched versions of papers selected from IIZUKA ''98, this volume provides wide coverage, from neuronal function devices to vision systems, chaotic systems, and also an effective design methodology of hierarchical large-scale neural systems inspired by neuroscience. It can serve as a reference for graduate students and researchers working in the field of brainware. It is also a source of inspiration for research towards the realization of a silicon brain. Contents: Neuron MOS Transistor: The Concept and Its Application (T Shibata); Adaptive Learning Neuron Integrated Circuits Using Ferroelectric-Gate FETs (S-M Yoon et al.); An AnalogOCoDigital Merged Circuit Architecture Using PWM Techniques for Bio-Inspired Nonlinear Dynamical Systems (T Morie et al.); Application-Driven Design of Bio-Inspired Low-Power Vision Circuits and Systems (A KAnig et al.); Motion Detection with Bio-Inspired Analog MOS Circuits (H Yonezu et al.); cents MOS Cellular-Automaton Circuit for Picture Processing (M Ikebe & Y Amemiya); Semiconductor Chaos-Generating Elements of Simple Structure and Their Integration (K Hoh et al.); Computation in Single Neuron with Dendritic Trees (N Katayama et al.). Readership: Graduate students, researchers and industrialists in artificial intelligence, neural networks, machine perception, computer vision, pattern/handwriting recognition, image analysis and biocomputing."
Author: Tsutomu Miki Publisher: World Scientific ISBN: 9812810250 Category : Computers Languages : en Pages : 245
Book Description
The human brain, the ultimate intelligent processor, can handle ambiguous and uncertain information adequately. The implementation of such a human-brain architecture and function is called OC brainwareOCO. Brainware is a candidate for the new tool that will realize a human-friendly computer society. As one of the LSI implementations of brainware, a OC bio-inspiredOCO hardware system is discussed in this book. Consisting of eight enriched versions of papers selected from IIZUKA ''98, this volume provides wide coverage, from neuronal function devices to vision systems, chaotic systems, and also an effective design methodology of hierarchical large-scale neural systems inspired by neuroscience. It can serve as a reference for graduate students and researchers working in the field of brainware. It is also a source of inspiration for research towards the realization of a silicon brain. Contents: Neuron MOS Transistor: The Concept and Its Application (T Shibata); Adaptive Learning Neuron Integrated Circuits Using Ferroelectric-Gate FETs (S-M Yoon et al.); An AnalogOCoDigital Merged Circuit Architecture Using PWM Techniques for Bio-Inspired Nonlinear Dynamical Systems (T Morie et al.); Application-Driven Design of Bio-Inspired Low-Power Vision Circuits and Systems (A KAnig et al.); Motion Detection with Bio-Inspired Analog MOS Circuits (H Yonezu et al.); cents MOS Cellular-Automaton Circuit for Picture Processing (M Ikebe & Y Amemiya); Semiconductor Chaos-Generating Elements of Simple Structure and Their Integration (K Hoh et al.); Computation in Single Neuron with Dendritic Trees (N Katayama et al.). Readership: Graduate students, researchers and industrialists in artificial intelligence, neural networks, machine perception, computer vision, pattern/handwriting recognition, image analysis and biocomputing."
Author: K Ploog Publisher: CRC Press ISBN: 9780750307048 Category : Science Languages : en Pages : 568
Book Description
An international perspective on the latest research, Compound Semiconductors 1999 presents an overview of important developments in all III-V compound semiconductors such as GaAs, InP, and GaN; II-VI compounds such as ZnS, ZnSe, and CdTe; IV-IV compounds such as SiC and SiGe; and IV-VI compounds such as PbTe and SnTe. The book emphasizes piezoelectric (or potentially smart) material heterostructures (Ga, Al, In)N, which will influence future research and development funding. As the preeminent forum for research in compound materials and their applications in devices, this essential library reference is invaluable reading for all researchers in semiconductor physics, and electronic and electrical engineering.
Author: Denis Flandre Publisher: Springer Science & Business Media ISBN: 1402030134 Category : Technology & Engineering Languages : en Pages : 358
Book Description
This proceedings volume archives the contributions of the speakers who attended the NATO Advanced Research Workshop on “Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment” held at the Sanatorium Puscha Ozerna, th th Kyiv, Ukraine, from 25 to 29 April 2004. The semiconductor industry has maintained a very rapid growth during the last three decades through impressive technological achievements which have resulted in products with higher performance and lower cost per function. After many years of development semiconductor-on-insulator materials have entered volume production and will increasingly be used by the manufacturing industry. The wider use of semiconductor (especially silicon) on insulator materials will not only enable the benefits of these materials to be further demonstrated but, also, will drive down the cost of substrates which, in turn, will stimulate the development of other novel devices and applications. In itself this trend will encourage the promotion of the skills and ideas generated by researchers in the Former Soviet Union and Eastern Europe and their incorporation in future collaborations.
Author: J.-P. Colinge Publisher: Springer Science & Business Media ISBN: 1441991069 Category : Technology & Engineering Languages : en Pages : 375
Book Description
Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis.
Author: M. Cahay Publisher: The Electrochemical Society ISBN: 9781566773522 Category : Technology & Engineering Languages : en Pages : 416
Book Description
"This book is a collection of some of the papers presented at the Sixth International Symposium on Quantum Confinement: Nanostructures Materials and Quantum Devices held September 5-6, 2001 in San Francisco, CA, as part of the 200th Meeting of the Electrochemical Society."
Author: Rajiv Kohli Publisher: William Andrew ISBN: 0323312705 Category : Technology & Engineering Languages : en Pages : 898
Book Description
Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. - Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination - Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry - Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field
Author: Y. Pauleau Publisher: Springer Science & Business Media ISBN: 940100353X Category : Technology & Engineering Languages : en Pages : 372
Book Description
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author: Tsutomu Miki
Author: Tsutomu Miki
Author: K Ploog
Author: Denis Flandre
Author: S. Shingubara
Author: J. A. Martino
Author: British Library. Document Supply Centre
Author: J.-P. Colinge
Author: M. Cahay
Author: Rajiv Kohli
Author: Y. Pauleau