Author: Hung Chang LinPublisher:
ISBN:
Category : Metal oxide semiconductors
Languages : en
Pages : 82
Book Description
Experimental Investigation of a Double-diffused MOS Structure
Author: H. C. LinPublisher:
ISBN:
Category : Metal oxide semiconductors
Languages : en
Pages : 84
Book Description
Experimental Investigation of a Double-diffused MOS Structure
Author: Hung Chang LinPublisher:
ISBN:
Category : Metal oxide semiconductors
Languages : en
Pages : 82
Book Description
Experimental Investigation of a Shielded Complementary Metal-Oxide Semiconductor (MOS) Structure
Author: Scientific and Technical Aerospace Reports
Author: Monthly Catalog of United States Government Publications
Author: Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 1194
Book Description
The Aeronautical Journal
Author: Cumulative Title Index to United States Public Documents, 1789-1976
Author: Daniel W. LesterPublisher:
ISBN:
Category : Government publications
Languages : en
Pages : 578
Book Description
Government Reports Annual Index
Author: Publisher:
ISBN:
Category : Research
Languages : en
Pages : 1150
Book Description
Sections 1-2. Keyword Index.--Section 3. Personal author index.--Section 4. Corporate author index.-- Section 5. Contract/grant number index, NTIS order/report number index 1-E.--Section 6. NTIS order/report number index F-Z.
Fundamentals of Semiconductor Processing Technology
Author: Badih El-KarehPublisher: Springer Science & Business Media
ISBN: 1461522099
Category : Technology & Engineering
Languages : en
Pages : 605
Book Description
The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Author: Donald B. Treen