Author: Wolfgang Skorupa
Publisher: Springer Science & Business Media
ISBN: 3319031317
Category : Technology & Engineering
Languages : en
Pages : 330
Book Description
The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
Subsecond Annealing of Advanced Materials
Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications
Author: F. Roozeboom
Publisher: The Electrochemical Society
ISBN: 1566778638
Category : Science
Languages : en
Pages : 377
Book Description
This issue of ECS Transactions covers emerging materials, process and technology options for large-area silicon wafers to enhance advanced IC performance or to enable revolutionary device structures with entirely new functionalities. Topics : high-mobility channel materials, (e.g. strained Si/Ge, compound semiconductors and graphene), high-performance gate stacks and low-resistivity junctions and contacts on new, Si-compatible materials; new materials and processes for 3-D (TSV) integration ; synthesis of nano-structures including wires, pores and membranes of Si-compatible materials; novel MEMS/NEMS structures and their integration with the mainstream Si-IC technology.
Publisher: The Electrochemical Society
ISBN: 1566778638
Category : Science
Languages : en
Pages : 377
Book Description
This issue of ECS Transactions covers emerging materials, process and technology options for large-area silicon wafers to enhance advanced IC performance or to enable revolutionary device structures with entirely new functionalities. Topics : high-mobility channel materials, (e.g. strained Si/Ge, compound semiconductors and graphene), high-performance gate stacks and low-resistivity junctions and contacts on new, Si-compatible materials; new materials and processes for 3-D (TSV) integration ; synthesis of nano-structures including wires, pores and membranes of Si-compatible materials; novel MEMS/NEMS structures and their integration with the mainstream Si-IC technology.
Amorphous and Polycrystalline Thin Film Silicon Science and Technology - 2009: Volume 1153
Author: Andrew Flewitt
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 514
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 514
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Laser Annealing Processes in Semiconductor Technology
Author: Fuccio Cristiano
Publisher: Woodhead Publishing
ISBN: 0128202564
Category : Technology & Engineering
Languages : en
Pages : 428
Book Description
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
Publisher: Woodhead Publishing
ISBN: 0128202564
Category : Technology & Engineering
Languages : en
Pages : 428
Book Description
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
2011 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT)
Author:
Publisher: The Electrochemical Society
ISBN: 1566778999
Category : Integrated circuits
Languages : en
Pages : 256
Book Description
Publisher: The Electrochemical Society
ISBN: 1566778999
Category : Integrated circuits
Languages : en
Pages : 256
Book Description
JJAP
Electrical & Electronics Abstracts
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
Book Description
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
Book Description
Liquid Crystal Displays
Author: Ernst Lueder
Publisher: Wiley-Blackwell
ISBN:
Category : Science
Languages : en
Pages : 376
Book Description
The special feature of the book is the in depth treatment of both the electro-optic effects and the addressing schemes of liquid crystal displays elucidating their interdependence. After basic explanations readily understandable for students and stimulating for engineers, physicists and chemists, the reader is gradually led to the latest developments such as vertically aligned and mixed mode TN-displays, compensation foils, multiple line and low power addressing, transistor driven LCOS-devices with DRAM and SRAM addressing and TFT-addressing of transmissive displays with a 92% aperture ratio. The results are analytically derived and not merely stated to enhance insight and the capability to tailor displays to individual needs or to perform novel designs. Towards this aim the propagation of light with the help of Jones vectors, four different characterizations of the state of polarization and the operation as well as the passive and active matrix addressing of all LCDs, like nematic, polymer dispersed, guest host and bistable devices is explained. Besides the mainstream twisted and supertwisted nematic LCDs attention is drawn to bistable ferroelectric, chiral nematic and modified nematic LCDs as they are most promising for future portable low power systems. Tables on display formats and units for the measurement of displays finally render the book suitable as a reference for experts working in the field and as a textbook for universities or display courses. The forefront of research is reached by the treatment of plastic substrates, the replacement of vacuum processes by less expensive printing and low temperature fabrication of a-Si- and poly-Si-TFTS.
Publisher: Wiley-Blackwell
ISBN:
Category : Science
Languages : en
Pages : 376
Book Description
The special feature of the book is the in depth treatment of both the electro-optic effects and the addressing schemes of liquid crystal displays elucidating their interdependence. After basic explanations readily understandable for students and stimulating for engineers, physicists and chemists, the reader is gradually led to the latest developments such as vertically aligned and mixed mode TN-displays, compensation foils, multiple line and low power addressing, transistor driven LCOS-devices with DRAM and SRAM addressing and TFT-addressing of transmissive displays with a 92% aperture ratio. The results are analytically derived and not merely stated to enhance insight and the capability to tailor displays to individual needs or to perform novel designs. Towards this aim the propagation of light with the help of Jones vectors, four different characterizations of the state of polarization and the operation as well as the passive and active matrix addressing of all LCDs, like nematic, polymer dispersed, guest host and bistable devices is explained. Besides the mainstream twisted and supertwisted nematic LCDs attention is drawn to bistable ferroelectric, chiral nematic and modified nematic LCDs as they are most promising for future portable low power systems. Tables on display formats and units for the measurement of displays finally render the book suitable as a reference for experts working in the field and as a textbook for universities or display courses. The forefront of research is reached by the treatment of plastic substrates, the replacement of vacuum processes by less expensive printing and low temperature fabrication of a-Si- and poly-Si-TFTS.
Physics Briefs
Handbook of Laser Micro- and Nano-Engineering
Author: KOJI SUGIOKA.
Publisher:
ISBN: 9783319695372
Category : Lasers in engineering
Languages : en
Pages :
Book Description
This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.
Publisher:
ISBN: 9783319695372
Category : Lasers in engineering
Languages : en
Pages :
Book Description
This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.