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Author: Peter M. Martin Publisher: William Andrew ISBN: 0815520328 Category : Technology & Engineering Languages : en Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author: Eric Garfunkel Publisher: Springer Science & Business Media ISBN: 9780792350071 Category : Technology & Engineering Languages : en Pages : 528
Book Description
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Author: D. K. Biegelsen Publisher: ISBN: Category : Computers Languages : en Pages : 312
Book Description
Materials tunneling microscopy for hydrogen-desorption-induced structural change of Si(111) surface; Steps on the (110) surface InP; Scanning tunneling microscopy on charge density waves in layered compounds; Design of ultra high vacuum scanning electron microscope combined with scanning tunneling microscope; Scanning tunneling microscopy perspective of structures on reduced SrTiO3(001) surfaces; Surface structure and electronic property of reduced SrTiO3(100) surface observed by STM/STS; Metastable structural surface excitations and concerted adatom motions: a STM study of atomic motions within a semiconductor surface; Mechanisms and energetics of surface atomic processes: an atom-probe field ion microscope study; Atomic arrangement of Al near the phase boundaries between square root 3X square root 3-Al and 7X7 structures on Si(111) surfaces; Growth and surface morphology of thin silicon films using an atomic force microscope; Solving interface structures by combined electron microscopy and X-ray diffraction; Quantitative hrem study of the atomic structure of the sum(310)/[001] symmetric tilt grain boundary in Nb; Hrtem observation of a sum =3 \{112\} bicrystal boundary in aluminum; Atomic structure of the (310) twin in niobium; theoretical predictions and comparison with experimental observation; Quantitative high-resolution electron microscopy of grain boundaries in gamma-Al2=3; Comparisons of observed and simulated atomic structures of Pd/NiO heterophase interfaces; Atomic structure of sum =5 (130) symmetrical tilt boundary in strontium titanate; Assessment of GaInAs/GaInAsP interdiffusion profiles obtained using stem-edx and hrem; Electron microscopy characterization of epitaxial growth of Ag deposited on MgO microcubes; Real-time viewinf of dynamic processes on CdTe surfaces at elevated temperature; AFM imaging of the crystalline-to-amorphous transition on the surface of ion-implanted mica; AFM imagings of ferritin molecules bound to LB films of poly-1-benzyl-L-histidine; Artifacts in atomic force microscopy of nanoporous and mesoporous fiducial samples; Al induced reconstructions on the Si(111) surfaces studied by scanning tunneling microscopy; Structure of the sum =3 (111) grain boundary in Cu-1.5%Sb; High resolution electron microscopy of sum =3 NiSi2 (111)/(115) Si and NiSi2(221)/(001)Si interfaces; Image simulations of Ge twin boundaries; Surface structure of oxide catalyst microcrystals: high resolution electron microscopy study; A microstructural study of reaction-bonded silicon carbide...
Author: Harry A. Atwater
Author: Harry A. Atwater
Author: Harry A. Atwater
Author: Steven M. Yalisove
Author: Paul H. Townsend
Author: Peter M. Martin
Author: Eric Garfunkel
Author: M. Atzmon
Author: D. K. Biegelsen
Author: K. S. Jones
Author: Gholam-Abbas Nazri