Author: Mikhail T. GaleevPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 308
Book Description
Evaluation of Surface Modification Technologies for Growing Diamond Films in the Hot Filament Chemical Vapor Deposition System
Author: Mikhail T. GaleevPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 308
Book Description
Chemical Vapour Deposition of Diamond for Dental Tools and Burs
Author: Waqar AhmedPublisher: Springer
ISBN: 3319006487
Category : Technology & Engineering
Languages : en
Pages : 143
Book Description
This volume presents chemical vapour deposition of diamond films for application in cutting tools, microdrills, dental burs and surgical tools. It examines various deposition techniques, discusses mechanisms of diamond growth and their impact on cutting tool life and performance.
Scientific and Technical Aerospace Reports
Author: Diamond Films Handbook
Author: Jes AsmussenPublisher: CRC Press
ISBN: 9780203910603
Category : Science
Languages : en
Pages : 692
Book Description
The Diamond Films Handbook is an important source of information for readers involved in the new diamond film technology, emphasizing synthesis technologies and diamond film applications. Containing over 1600 references, drawings, photographs, micrographs, equations, and tables, and contributions by experts from both industry and academia, it inclu
Diamond Films
Author: Koji KobashiPublisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350
Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
A Study of Chemical Vapor Deposition Diamond Morphology
Author: John Michael LarsonDiamond Chemical Vapor Deposition
Author: Huimin LiuPublisher: Elsevier
ISBN: 0815516878
Category : Technology & Engineering
Languages : en
Pages : 207
Book Description
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.
Handbook of Industrial Diamonds and Diamond Films
Author: Mark A. PrelasPublisher: Routledge
ISBN: 135144249X
Category : Science
Languages : en
Pages : 1232
Book Description
Examines both mined and synthetic diamonds and diamond films. The text offers coverage on the use of diamond as an engineering material, integrating original research on the science, technology and applications of diamond. It discusses the use of chemical vapour deposition grown diamonds in electronics, cutting tools, wear resistant coatings, thermal management, optics and acoustics, as well as in new products.
Publications of the National Institute of Standards and Technology ... Catalog
Author: National Institute of Standards and Technology (U.S.)Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 464
Book Description
Preferentially Oriented Growth of Diamond Film on Silicon Substrate
Author: Anupam K.C.Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 184
Book Description
A multistep deposition technique has been developed to grow and nucleate a diamond film directly on Silicon substrate in a hot filament chemical vapor deposition system. The high-quality diamond film is deposited on the silicon substrate with an intermediate nickel thin film with less graphitic co-deposition. The extremely high surface energies, interfacial lattice misfit and strain energies between the diamond film and the non- diamond substrate is the main problems for the oriented film on the substrate. Thus, an intermediate thin nickel film is deposited on the silicon substrate to develop the texture and the oriented diamond film by the process of annealing. The annealing temperature of the film is determined from the molten phase state of the nickel, silicon, carbon, and hydrogen. The growth kinetics and diamond film texture are also studied by the growth of diamond film on different nickel modification layers without annealing. The oriented diamond film is anticipated to have high thermal conductivity and low surface roughness and is useful as a substrate for high electron mobility transistor (HEMT) devices to improve the thermal boundary resistance (TBR). The purpose of this research is to grow an oriented diamond film on a silicon substrate without graphitic interlayers, and the results of this study will be valuable for the semiconductor industry such as the integration of diamond in ultra-high power (GaN/AlGaN) HEMT devices to increase the device lifetime and thermal management.