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Author: Kazuo Nojiri Publisher: Springer ISBN: 3319102958 Category : Technology & Engineering Languages : en Pages : 126
Book Description
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Author: Kazuo Nojiri Publisher: Springer ISBN: 3319102958 Category : Technology & Engineering Languages : en Pages : 126
Book Description
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Author: Catherine Jenkins Publisher: Metropolitan Museum of Art ISBN: 1588396495 Category : Art Languages : en Pages : 311
Book Description
The Renaissance of Etching is a groundbreaking study of the origins of the etched print. Initially used as a method for decorating armor, etching was reimagined as a printmaking technique at the end of the fifteenth century in Germany and spread rapidly across Europe. Unlike engraving and woodcut, which required great skill and years of training, the comparative ease of etching allowed a wide variety of artists to exploit the expanding market for prints. The early pioneers of the medium include some of the greatest artists of the Renaissance, such as Albrecht Dürer, Parmigianino, and Pieter Bruegel the Elder, who paved the way for future printmakers like Rembrandt, Goya, and many others in their wake. Remarkably, contemporary artists still use etching in much the same way as their predecessors did five hundred years ago. Richly illustrated and including a wealth of new information, The Renaissance of Etching explores how artists in Germany, the Netherlands, Italy, and France developed the new medium of etching, and how it became one of the most versatile and enduring forms of printmaking. p.p1 {margin: 0.0px 0.0px 0.0px 0.0px; font: 14.0px Verdana}
Author: M. Sugawara Publisher: OUP Oxford ISBN: 0191590290 Category : Technology & Engineering Languages : en Pages : 362
Book Description
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Author: Bill Fick Publisher: Laurence King Publishing ISBN: 9781780671949 Category : Art Languages : en Pages : 0
Book Description
Printmaking is a practical and comprehensive guide to printmaking techniques with clear step–by–step illustrations. This fully updated second edition contains new images throughout, including improved process shots and examples of the latest work from contemporary printmakers. There are expanded chapters on digital and mixed media processes, as well as a brand new 'Print & Make' chapter, which explores the opportunities for creative expression within the many processes available to print makers. For example, this edition includes a new, detailed section on Japanese moku hanga woodblock printing while the more traditional techniques of relief, intaglio, collograph, lithography, screen printing and monoprint have also been refreshed. The addition of new images showing a broader range of subject matter, include more contemporary prints and international artists. Each technique is explored from the development of the printing or digital matrix, through the different stages of creation to image output. Guidance on how to set up a print studio, sections on troubleshooting techniques and the inclusion of up–to–date lists of suppliers, workshops and galleries make this an essential volume for beginner and experienced printmakers alike. Special attention is given to safe practices, addressing the important concern for health and safety. Step–by–step illustrations provide an enhanced visual reference – either photographic or diagrams for clarity – and the authors have supplied more information on safer and more sustainable practices. Since nontoxic alternatives are a rapidly growing and ever–evolving landscape, Printmaking 2nd Edition presents products and practices that are accessible worldwide. Praise for Printmaking 2nd Edition 'A lavishly illustrated large–format volume that constitutes a veritable printmaker's bible.' – The West Australia News
Author: A.J. van Roosmalen Publisher: Springer Science & Business Media ISBN: 148992566X Category : Science Languages : en Pages : 247
Book Description
This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Author: Daisuke Kuroiwa Publisher: ISBN: Category : Ice crystals Languages : en Pages : 56
Book Description
Thermal etching of ice and its application to the investigation of surface abrasion in ice crystals is explained. Investigations of surface abrasion in ice crystals provide fundamental information in the study of snow and ice friction. The technique of producing evaporation etch pits by the application of Formvar film to the ice crystal surface is described, and the development of microcrystals by recrystallization is compared with the surrounding mother crystals. Experimental data are presented and discussed with emphasis on the development of thermal etch pits, scratches on different crystal faces, damage to the prismatic face, thermal etch channels on the basal plane, predominant orientation of etch channels on the basal plane, and etch-pit-free zones and stress concentrations around solid inclusions. (Author).
Author: Kazuo Nojiri
Author: Kazuo Nojiri
Author: Catherine Jenkins
Author: M. Sugawara
Author: Henry Thomas Alken
Author: Bill Fick
Author: G. S. Mathad
Author: Ernest S. Lumsden
Author: A.J. van Roosmalen
Author: Raymond Davis
Author: Daisuke Kuroiwa