Author: R Geller
Publisher: Routledge
ISBN: 135145322X
Category : Science
Languages : en
Pages : 456
Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Electron Cyclotron Resonance Ion Sources and ECR Plasmas
Author: R Geller
Publisher: Routledge
ISBN: 135145322X
Category : Science
Languages : en
Pages : 456
Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Publisher: Routledge
ISBN: 135145322X
Category : Science
Languages : en
Pages : 456
Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Electron Cyclotron Resonance Ion Sources and ECR Plasmas
Author: R Geller
Publisher: CRC Press
ISBN: 9780750301077
Category : Science
Languages : en
Pages : 456
Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.
Publisher: CRC Press
ISBN: 9780750301077
Category : Science
Languages : en
Pages : 456
Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.
The Physics and Technology of Ion Sources
Author: Ian G. Brown
Publisher: John Wiley & Sons
ISBN: 3527604545
Category : Science
Languages : en
Pages : 396
Book Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
Publisher: John Wiley & Sons
ISBN: 3527604545
Category : Science
Languages : en
Pages : 396
Book Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
Handbook of Ion Sources
Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 9780849325021
Category : Technology & Engineering
Languages : en
Pages : 558
Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Publisher: CRC Press
ISBN: 9780849325021
Category : Technology & Engineering
Languages : en
Pages : 558
Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Microwave Discharges
Author: Carlos M. Ferreira
Publisher: Springer Science & Business Media
ISBN: 1489911308
Category : Science
Languages : en
Pages : 556
Book Description
Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Publisher: Springer Science & Business Media
ISBN: 1489911308
Category : Science
Languages : en
Pages : 556
Book Description
Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Atom and Ion Sources
Author: László Vályi
Publisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 440
Book Description
Publisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 440
Book Description
Plasma Physics via Computer Simulation
Author: C.K. Birdsall
Publisher: CRC Press
ISBN: 1482263068
Category : Science
Languages : en
Pages : 504
Book Description
Divided into three main parts, the book guides the reader to an understanding of the basic concepts in this fascinating field of research. Part 1 introduces you to the fundamental concepts of simulation. It examines one-dimensional electrostatic codes and electromagnetic codes, and describes the numerical methods and analysis. Part 2 explores the mathematics and physics behind the algorithms used in Part 1. In Part 3, the authors address some of the more complicated simulations in two and three dimensions. The book introduces projects to encourage practical work Readers can download plasma modeling and simulation software — the ES1 program — with implementations for PCs and Unix systems along with the original FORTRAN source code. Now available in paperback, Plasma Physics via Computer Simulation is an ideal complement to plasma physics courses and for self-study.
Publisher: CRC Press
ISBN: 1482263068
Category : Science
Languages : en
Pages : 504
Book Description
Divided into three main parts, the book guides the reader to an understanding of the basic concepts in this fascinating field of research. Part 1 introduces you to the fundamental concepts of simulation. It examines one-dimensional electrostatic codes and electromagnetic codes, and describes the numerical methods and analysis. Part 2 explores the mathematics and physics behind the algorithms used in Part 1. In Part 3, the authors address some of the more complicated simulations in two and three dimensions. The book introduces projects to encourage practical work Readers can download plasma modeling and simulation software — the ES1 program — with implementations for PCs and Unix systems along with the original FORTRAN source code. Now available in paperback, Plasma Physics via Computer Simulation is an ideal complement to plasma physics courses and for self-study.
High Density Plasma Sources
Author: Oleg A. Popov
Publisher:
ISBN: 9786612253218
Category : Electronic books
Languages : en
Pages : 445
Book Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.
Publisher:
ISBN: 9786612253218
Category : Electronic books
Languages : en
Pages : 445
Book Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.
Gamow Shell Model
Author: Nicolas Michel
Publisher: Springer Nature
ISBN: 3030693562
Category : Science
Languages : en
Pages : 514
Book Description
This book provides the first graduate-level, self-contained introduction to recent developments that lead to the formulation of the configuration-interaction approach for open quantum systems, the Gamow shell model, which provides a unitary description of quantum many-body system in different regimes of binding, and enables the unification in the description of nuclear structure and reactions. The Gamow shell model extends and generalizes the phenomenologically successful nuclear shell model to the domain of weakly-bound near-threshold states and resonances, offering a systematic tool to understand and categorize data on nuclear spectra, moments, collective excitations, particle and electromagnetic decays, clustering, elastic and inelastic scattering cross sections, and radiative capture cross sections of interest to astrophysics. The approach is of interest beyond nuclear physics and based on general properties of quasi-stationary solutions of the Schrödinger equation – so-called Gamow states. For the benefit of graduate students and newcomers to the field, the quantum-mechanical fundamentals are introduced in some detail. The text also provides a historical overview of how the field has evolved from the early days of the nuclear shell model to recent experimental developments, in both nuclear physics and related fields, supporting the unified description. The text contains many worked examples and several numerical codes are introduced to allow the reader to test different aspects of the continuum shell model discussed in the book.
Publisher: Springer Nature
ISBN: 3030693562
Category : Science
Languages : en
Pages : 514
Book Description
This book provides the first graduate-level, self-contained introduction to recent developments that lead to the formulation of the configuration-interaction approach for open quantum systems, the Gamow shell model, which provides a unitary description of quantum many-body system in different regimes of binding, and enables the unification in the description of nuclear structure and reactions. The Gamow shell model extends and generalizes the phenomenologically successful nuclear shell model to the domain of weakly-bound near-threshold states and resonances, offering a systematic tool to understand and categorize data on nuclear spectra, moments, collective excitations, particle and electromagnetic decays, clustering, elastic and inelastic scattering cross sections, and radiative capture cross sections of interest to astrophysics. The approach is of interest beyond nuclear physics and based on general properties of quasi-stationary solutions of the Schrödinger equation – so-called Gamow states. For the benefit of graduate students and newcomers to the field, the quantum-mechanical fundamentals are introduced in some detail. The text also provides a historical overview of how the field has evolved from the early days of the nuclear shell model to recent experimental developments, in both nuclear physics and related fields, supporting the unified description. The text contains many worked examples and several numerical codes are introduced to allow the reader to test different aspects of the continuum shell model discussed in the book.
Handbook of Ion Beam Processing Technology
Author: Jerome J. Cuomo
Publisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 464
Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Publisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 464
Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.