Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing IV PDF Download

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

View

Book Description

Author:
Publisher:
ISBN:
Category : Ion beam lithography
Languages : en
Pages : 440

View

Book Description

Author: Phillip D. Blais
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 236

View

Book Description

Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704

View

Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Author: David O. Patterson
Publisher:
ISBN: 9780819414892
Category : Ion beam lithography
Languages : en
Pages : 420

View

Book Description

Author: P. Rai-Choudhury
Publisher: SPIE Press
ISBN: 9780819423788
Category : Technology & Engineering
Languages : en
Pages : 780

View

Book Description
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.

Author: Douglas J. Resnick
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 364

View

Book Description

Author: Alberto Pique
Publisher: Academic Press
ISBN: 9780121742317
Category : Computers
Languages : en
Pages : 756

View

Book Description
Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. An overview of the different direct write techniques currently available A comparison between the strengths and special attributes for each of the techniques An overview of the state-of-the-art technology involved in this field

Author: Arnold W. Yanof
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 340

View

Book Description

Author: J. Xie
Publisher: Elsevier
ISBN: 008093353X
Category : Science
Languages : en
Pages : 702

View

Book Description
This volume contains Part II of the proceedings of the conference on Free Electron Lasers, held in Beijing, August 1997. Part I appears in a special issue of Nuclear Instruments and Methods A.The last 20 years has seen different stages of FEL development. In these proceedings the reader will find descriptions of many new facilities, new experimental results, new applications, new theoretical developments and new simulation results. Attention is also focussed on the recent progress in experimental observations SASE. The contributions are from 150 scientists from 13 countries, ensuring broad, up-to-date research results from a dynamic field.