Author: Phillip D. BlaisPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 280
Book Description
Electron-beam, X-ray, and Ion-beam Lithographies VI
Author: Phillip D. BlaisPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 280
Book Description
ELECTRON-BEAM, X-RAY, AND ION-BEAM LITHOGRAPHIES VI.
Author: Phillip D. BlaisEUV Lithography
Author: Vivek BakshiPublisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing
Author: Publisher:
ISBN:
Category : Ion beam lithography
Languages : en
Pages : 488
Book Description
Electron-beam, X-ray, and Ion-beam Lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California
![Electron-beam, X-ray, and Ion-beam Lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California PDF](https://books.google.com/books/content/images/frontcover/t1OozwEACAAJ?fife=w80-h100)
Author: Electron-beam, X-ray, and Ion-beam Technology
Author: Arnold W. YanofPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 340
Book Description
Electron-beam, X-ray, & Ion-beam Techniques for Submicrometer Lithographies V
Author: Phillip D. BlaisPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 294
Book Description
Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies III
Author: Alfred WagnerPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 152
Book Description
Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography
Author: P. Rai-ChoudhuryPublisher: SPIE Press
ISBN: 9780819423788
Category : Technology & Engineering
Languages : en
Pages : 780
Book Description
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies IV
Author: Phillip D. BlaisPublisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 236
Book Description