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Author: George Brewer Publisher: Elsevier ISBN: 0323153410 Category : Technology & Engineering Languages : en Pages : 377
Book Description
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author: George Brewer Publisher: Elsevier ISBN: 0323153410 Category : Technology & Engineering Languages : en Pages : 377
Book Description
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author: Ivo Utke Publisher: OUP USA ISBN: 0199734216 Category : Technology & Engineering Languages : en Pages : 830
Book Description
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Author: Ivor Brodie Publisher: Springer Science & Business Media ISBN: 1475767757 Category : Science Languages : en Pages : 661
Book Description
In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.
Author: D Bucknall Publisher: Elsevier ISBN: 1845690907 Category : Science Languages : en Pages : 424
Book Description
Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications.A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices.With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices. - Looks at alternative approaches used to develop complex patterns at the nanoscale - Concentrates on state of the art nanolithographic methods - Written by a distinguished international team of contributors
Author: João Antonio Martino Publisher: The Electrochemical Society ISBN: 1566775655 Category : Microelectronics Languages : en Pages : 615
Book Description
The SBMicro symposium is a forum dedicated to fabrication and modeling of Microsystems, integrated circuits and devices. The goal of the symposium is to bring together researchers in the areas of processing, materials, characterization, modeling and TCAD of integrated circuits, microsensors, microactuators, and MEMS. This issue contains the papers presented at the 2007 conference.
Author: Zheng Cui Publisher: Springer Science & Business Media ISBN: 0387755772 Category : Technology & Engineering Languages : en Pages : 350
Book Description
This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
Author: George Brewer
Author: George Brewer
Author: 
Author: Ivo Utke
Author: Ivor Brodie
Author: D Bucknall
Author: Richard H. Van Atta
Author: João Antonio Martino
Author: Phillip D. Blais
Author: Zheng Cui
Author: United States. National Bureau of Standards