Electron-beam Processes PDF Download

Author: Herbert W. Mishler
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 72

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Book Description
Operation of the electron-beam process for welding, melting, and achining is described. The different classes of equipment for each of the 3 processes are dicussed, and commercialy available equipment, both domestic and foreign, is described and illustrated.

Author: Robert Wray Hamm
Publisher: World Scientific
ISBN: 9814307041
Category : Science
Languages : en
Pages : 436

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Book Description
This unique new book is a comprehensive review of the many current industrial applications of particle accelerators, written by experts in each of these fields. Readers will gain a broad understanding of the principles of these applications, the extent to which they are employed, and the accelerator technology utilized. The book also serves as a thorough introduction to these fields for non-experts and laymen. Due to the increased interest in industrial applications, there is a growing interest among accelerator physicists and many other scientists worldwide in understanding how accelerators are used in various applications. The government agencies that fund scientific research with accelerators are also seeking more information on the many commercial applications that have been or can be developed with the technology developments they are funding. Many industries are also doing more research on how they can improve their products or processes using particle beams

Author: H Schultz
Publisher: Elsevier
ISBN: 1845698789
Category : Technology & Engineering
Languages : en
Pages : 245

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Book Description
Translated from the German, this is a practical book for engineers which explains the trials, development and manufacturing processes involved in electron beam welding.

Author: George Brewer
Publisher: Elsevier
ISBN: 0323153410
Category : Technology & Engineering
Languages : en
Pages : 377

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Book Description
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

Author: Yuan Lin
Publisher: John Wiley & Sons
ISBN: 3527696458
Category : Technology & Engineering
Languages : en
Pages : 328

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Book Description
This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

Author: Werner Zapka
Publisher: John Wiley & Sons
ISBN: 3527338322
Category : Technology & Engineering
Languages : en
Pages : 946

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Book Description
Unique in its integration of individual topics to achieve a full-system approach, this book addresses all the aspects essential for industrial inkjet printing. After an introduction listing the industrial printing techniques available, the text goes on to discuss individual topics, such as ink, printheads and substrates, followed by metrology techniques that are required for reliable systems. Three iteration cycles are then described, including the adaptation of the ink to the printhead, the optimization of the ink to the substrate and the integration of machine manufacturing, monitoring, and data handling, among others. Finally, the book summarizes a number of case studies and success stories from selected areas, including graphics, printed electronics, and 3D printing as well a list of ink suppliers, printhead manufacturers and integrators. Practical hints are included throughout for a direct hands-on experience. Invaluable for industrial users and academics, whether ink developers or mechanical engineers, and working in areas ranging from metrology to intellectual property.

Author: Maria Stepanova
Publisher: Springer Science & Business Media
ISBN: 3709104246
Category : Technology & Engineering
Languages : en
Pages : 344

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Book Description
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Author: Pierre-Gilles de Gennes
Publisher: Springer Science & Business Media
ISBN: 0387216561
Category : Science
Languages : en
Pages : 298

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Book Description
The study of capillarity is in the midst of a veritable explosion. What is offered here is not a comprehensive review of the latest research but rather a compendium of principles designed for the undergraduate student and for readers interested in the physics underlying these phenomena.

Author: Oddur Ingólfsson
Publisher: CRC Press
ISBN: 0429602766
Category : Science
Languages : en
Pages : 254

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Book Description
Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.

Author: C.W. White
Publisher: Elsevier
ISBN: 0323142532
Category : Technology & Engineering
Languages : en
Pages : 788

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Book Description
Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.