Author: Jan Richard KraayeveldPublisher:
ISBN: 9789090089676
Category :
Languages : en
Pages : 98
Book Description
Zusammenfassung niederländisch.
Electromigration Studies on A1 (alloy) Thin Film Conductors by Means of 1/f Noise Measurements and High-resolution Resistance Experiments
Author: Jan Richard KraayeveldPublisher:
ISBN: 9789090089676
Category :
Languages : en
Pages : 98
Book Description
Zusammenfassung niederländisch.
The Study of Electromigration Reliability by the Use of 1/f and 1/f℗ Noise Measurements in Thin Metal Films
Author: Phinese Oren BarkleyPublisher:
ISBN:
Category : Electrodiffusion
Languages : en
Pages : 184
Book Description
Electromigration Induced Resistance Changes in Passivated Aluminum Thin Film Conductors
Author: U. E. MöcklElectromigration in Thin Film Amorphous and Polycrystalline Alloys
Author: Michael Francis ChisholmPublisher:
ISBN:
Category :
Languages : en
Pages : 378
Book Description
Electromigration in Thin Films and Electronic Devices
Author: Choong-Un KimPublisher:
ISBN: 9781613443910
Category : Thin films
Languages : en
Pages : 329
Book Description
Electromigration in Thin Film Aluminum Alloy Interconnects
Author: Lawrence Edward FeltonPublisher:
ISBN:
Category : Electrodiffusion
Languages : en
Pages : 220
Book Description
Semiconductor Material and Device Characterization
Author: Dieter K. SchroderPublisher: John Wiley & Sons
ISBN: 0471739065
Category : Technology & Engineering
Languages : en
Pages : 800
Book Description
This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.
The Physics of Ultra-High-Density Magnetic Recording
Author: M.L. PlumerPublisher: Springer Science & Business Media
ISBN: 364256657X
Category : Science
Languages : en
Pages : 364
Book Description
Application-oriented book on magnetic recording, focussing on the underlying physical mechanisms that play crucial roles in medium and transducer development for high areal density disk drives.
The Materials Science of Thin Films
Author: Milton OhringPublisher: Academic Press
ISBN: 9780125249904
Category : Science
Languages : en
Pages : 744
Book Description
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
Surface and Thin Film Analysis
Author: Gernot FriedbacherPublisher: Wiley-VCH
ISBN: 9783527320479
Category : Technology & Engineering
Languages : en
Pages : 0
Book Description
Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society)