Author: Stuart Bogatko
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 130

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Book Description

Author: Longcheng Wang
Publisher: ProQuest
ISBN: 9780549387589
Category : Copper oxide
Languages : en
Pages :

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Book Description
Copper oxides, including cuprous oxide and cupric oxide, are prepared by electrochemical deposition. The structural, optical and electrical properties of as-deposited copper oxides are evaluated, based on which cuprous oxide is selected as a promising material for photovoltaic applications. Electrodeposited cuprous oxide is a p-type semiconductor with a direct band gap of 2.06 eV. The mechanism of how pH affects the structural and electrical properties of electrodeposited cuprous oxide films is studied. In the pH range of 7.5 to 12.0, there are three different preferred crystal orientations: (100), (110) and (111). With different orientations, cuprous oxide shows different surface morphology and grain size. Bath pH effect on structural properties is explained by its effect on the growth rate of different crystallographic planes with different Cu+/O2- ratios. Capacitance-voltage measurements are performed to study electrical properties of differently oriented cuprous oxide films. The results show that the flat band potential shifts negatively as the bath pH increases. Electrodeposited cupric oxide is a p-type cupric oxide with an indirect band gap of 1.32 eV. Different cleaning methods are used to clean the substrate surface for electrodeposition of cupric oxide. Electrochemical etching is proven to be an effective method for Cu substrate cleaning in cupric oxide deposition. In particular, in-situ electrochemical etching is developed, which prevents the cleaned substrate from exposure to air. Current-voltage characterization shows that cupric oxide deposited on electrochemically etched Cu substrates has favorable electrical properties and better rectification behavior. Cuprous oxide is selected for the fabrication of p-n homo-junction because it has better crystallinity, bigger grains, better control over crystal quality and a direct band gap. Based on the model that bath pH can control the stoichiometry and native point defects in electrodeposited cuprous oxide films, both p-type and n-type cuprous oxides are successfully deposited at different bath pH values. For samples deposited at pH below 7.5, cuprous oxides are n-type semiconductors, while at bath pH above 9.0, cuprous oxides are p-type semiconductors. Furthermore, a two-step deposition process is developed to fabricate a p-n homo-junction in cuprous oxide. Current-voltage measurements show a typical rectification behavior of a p-n junction for these samples, which suggest that a p-n homo-junction of cuprous oxide is achieved, which is, to our knowledge, the first p-n homo-junction of cuprous oxide prepared by any method. The significance of this invention is because it enables the fabrication of solar cell with a reasonable high conversion efficiency (& sim;10%) at a very low cost.

Author: Muhammad Muhibbullah
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659786785
Category :
Languages : en
Pages : 104

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Book Description
Thin films deposition techniques have been described in the book especially chemical deposition methods. Copper oxide thin films deposition using chemical spray pyrolysis, chemical bath and drop-chemical deposition techniques, and characterization such as compositional by AES, structural by XRD, morphological by SEM, electrical, optical by UViR double beam spectrometer, photo-electrochemical and current-voltage analyses have been described. Also CdS thin film of spray pyrolysis deposition and ZnO thin film of electrochemical deposition methods have been described shortly. The characterizations of the CuO-CdS heterojunction for rectification and the characterization of the Cu2O-ZnO heterojunction for rectification and solar cell application have been described.

Author: Sook Liang Teo
Publisher:
ISBN:
Category : Copper
Languages : en
Pages : 418

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Book Description

Author: Fabian I. Ezema
Publisher: Springer Nature
ISBN: 3030684628
Category : Technology & Engineering
Languages : en
Pages : 926

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Book Description
This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.

Author: G. Oskam
Publisher: The Electrochemical Society
ISBN: 156677800X
Category : Science
Languages : en
Pages : 234

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Book Description
This symposium provided a forum for current work on the electrodeposition and characterization of functional coatings and nanostructures. Central issues include the control of size and architecture and the ample choices and demands of substrate and deposited materials. The focus materials of this symposium were semiconductors, oxides and composites with e.g. ceramic nanoparticles or nanotubes.

Author: Milan Paunovic
Publisher: John Wiley & Sons
ISBN: 047000939X
Category : Science
Languages : en
Pages : 388

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Book Description
Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

Author: Mordechay Schlesinger
Publisher: John Wiley & Sons
ISBN: 0470167785
Category : Science
Languages : en
Pages : 755

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Book Description
The definitive resource for electroplating, now completely up to date With advances in information-age technologies, the field of electroplating has seen dramatic growth in the decade since the previous edition of Modern Electroplating was published. This expanded new edition addresses these developments, providing a comprehensive, one-stop reference to the latest methods and applications of electroplating of metals, alloys, semiconductors, and conductive polymers. With special emphasis on electroplating and electrochemical plating in nanotechnologies, data storage, and medical applications, the Fifth Edition boasts vast amounts of new and revised material, unmatched in breadth and depth by any other book on the subject. It includes: Easily accessible, self-contained contributions by over thirty experts Five completely new chapters and hundreds of additional pages A cutting-edge look at applications in nanoelectronics Coverage of the formation of nanoclusters and quantum dots using scanning tunneling microscopy (STM) An important discussion of the physical properties of metal thin films Chapters devoted to methods, tools, control, and environmental issues And much more A must-have for anyone in electroplating, including technicians, platers, plating researchers, and metal finishers, Modern Electroplating, Fifth Edition is also an excellent reference for electrical engineers and researchers in the automotive, data storage, and medical industries.

Author: Benjamin C. Wang
Publisher:
ISBN:
Category :
Languages : en
Pages : 122

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Book Description

Author: Rosalinda Inguanta
Publisher: BoD – Books on Demand
ISBN: 9535138839
Category : Technology & Engineering
Languages : en
Pages : 188

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Book Description
Semiconducting materials are widely used in several applications such as photonics, photovoltaics, electronics, and thermoelectrics, because of their optical and electro-optical features. The fundamental and technological importance of these materials is due to the unique physical and chemical properties. Over the years, numerous methods have been developed for the synthesis of high-efficient semiconductors. Moreover, a variety of approach and characterization methods have been used to study the numerous and fascinating properties of the semiconducting materials. This book collects new developments about semiconductors, from the fundamental issues to their synthesis and applications. Special attention has been devoted to electrochemical growth and characterization.