Atomic Scale Images of Acceptors in III-V Semiconductors PDF Download

Author: Sebastian Loth
Publisher: Universitätsverlag Göttingen
ISBN: 3940344141
Category :
Languages : en
Pages : 189

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Author: Zhiyong Ma
Publisher: CRC Press
ISBN: 135173394X
Category : Science
Languages : en
Pages : 889

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Book Description
Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.

Author: Giovanni Agostini
Publisher: Elsevier
ISBN: 0080558151
Category : Science
Languages : en
Pages : 501

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Book Description
In the last couple of decades, high-performance electronic and optoelectronic devices based on semiconductor heterostructures have been required to obtain increasingly strict and well-defined performances, needing a detailed control, at the atomic level, of the structural composition of the buried interfaces. This goal has been achieved by an improvement of the epitaxial growth techniques and by the parallel use of increasingly sophisticated characterization techniques and of refined theoretical models based on ab initio approaches. This book deals with description of both characterization techniques and theoretical models needed to understand and predict the structural and electronic properties of semiconductor heterostructures and nanostructures. - Comprehensive collection of the most powerful characterization techniques for semiconductor heterostructures and nanostructures - Most of the chapters are authored by scientists that are among the top 10 worldwide in publication ranking of the specific field - Each chapter starts with a didactic introduction on the technique - The second part of each chapter deals with a selection of top examples highlighting the power of the specific technique to analyze the properties of semiconductors

Author: Marília Caldas
Publisher: American Institute of Physics
ISBN: 9780735407367
Category : Technology & Engineering
Languages : en
Pages : 586

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Book Description
The conference covered the current and future direction for research in the area of physics of semiconductors, such as growth, sufaces, and interfaces, defects and impurities, wide-band-gap semiconductors, molecular systems, and organic semiconductors, and others.

Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1074

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Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1036

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Author: Dawn Bonnell
Publisher: Wiley
ISBN: 9780471187356
Category : Science
Languages : en
Pages : 436

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Book Description
Scanning tunneling microscopy (STM) provides three-dimensional real- space images of surfaces at high spatial resolution. When the surface is flat and clean, even atoms can be imaged. Its extreme usefulness has led it to near instantaneous acceptance as a characterization tool. This book covers fundamental concepts of STM operation, image interpretation, instrumentation, and techniques for various applications. It als contains advanced treatments of theory and spectroscopy. Surface physicists, electrochemists, materials scientists, and other scientists who see a use for STM will find the depth of coverage and accompanying reference lists in this book essential to their work. In addition, those who wish to add the capabilities of probe microscopy to their operations, such as microscopists and quality control engineers, will find the basic information in this book.

Author: M.T. Bray
Publisher: Springer Science & Business Media
ISBN: 1475793227
Category : Technology & Engineering
Languages : en
Pages : 431

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Book Description
The first U. S. Army Natick Research, Development and Engineering Center Atomic Force/Scanning Tunneling Microscopy (AFM/STM) Symposium was held on lune 8-10, 1993 in Natick, Massachusetts. This book represents the compilation of the papers presented at the meeting. The purpose ofthis symposium was to provide a forum where scientists from a number of diverse fields could interact with one another and exchange ideas. The various topics inc1uded application of AFM/STM in material sciences, polymers, physics, biology and biotechnology, along with recent developments inc1uding new probe microscopies and frontiers in this exciting area. The meeting's format was designed to encourage communication between members of the general scientific community and those individuals who are at the cutting edge of AFM, STM and other probe microscopies. It immediately became clear that this conference enabled interdisciplinary interactions among researchers from academia, industry and government, and set the tone for future collaborations. Expert scientists from diverse scientific areas including physics, chemistry, biology, materials science and electronics were invited to participate in the symposium. The agenda of the meeting was divided into three major sessions. In the first session, Biological Nanostructure, topics ranged from AFM ofDNA to STM imagmg ofthe biomoleeule tubulin and bacterialluciferase to the AFM of starch polymer double helices to AFM imaging of food surfaces.

Author: D. M. Mattox
Publisher: Cambridge University Press
ISBN: 0080946585
Category : Technology & Engineering
Languages : en
Pages : 947

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Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Author: Ashok K. Singh
Publisher: Academic Press
ISBN: 012801492X
Category : Medical
Languages : en
Pages : 556

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Book Description
Engineered Nanoparticles: Structure, Properties and Mechanisms of Toxicity is an indispensable introduction to engineered nanomaterials (ENM) and their potential adverse effects on human health and the environment. Although research in the area of pharmacology and toxicology of ENM is rapidly advancing, a possible correlation between their physicochemical properties and biomedical properties or toxicity is not yet fully understood. This understanding is essential to develop strategies for the safe applications and handling of ENM. The book comprehensively defines the current understanding of ENM toxicity, first describing these materials and their physicochemical properties, and then discussing the toxicological theory and methodology before finally demonstrating the potential impact of ENM on the environment and human health. It represents an essential reference for students and investigators in toxicology, pharmacology, chemistry, material sciences, medicine, and those in related disciplines who require an introduction to ENM and their potential toxicological effects. - Provides state-of-the-art physicochemical descriptions and methodologies for the characterization of engineered nanomaterials (ENM) - Describes the potential toxicological effects of ENM and the nanotoxicological mechanisms of action - Presents how to apply theory to practice in a public health and risk assessment setting