Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) PDF Download

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Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1)

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) PDF Author: Hemlock Semiconductor Corporation
Publisher:
ISBN:
Category : Chemical processes
Languages : en
Pages : 60

Book Description

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1)

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) PDF Author: Hemlock Semiconductor Corporation
Publisher:
ISBN:
Category : Chemical processes
Languages : en
Pages : 60

Book Description

Development of a Polysilicon Process Based on Chemical Vapor Deposition, Phase 1

Development of a Polysilicon Process Based on Chemical Vapor Deposition, Phase 1 PDF Author: National Aeronautics and Space Administration (NASA)
Publisher: Createspace Independent Publishing Platform
ISBN: 9781725582408
Category :
Languages : en
Pages : 32

Book Description
The goal of this program is to demonstrate that a dichlorosilane-based reductive chemical vapor deposition (CVD) process is capable of producing, at low cost, high quality polycrystalline silicon. Physical form and purity of this material will be consistent with LSA material requirements for use in the manufacture of high efficiency solar cells. Four polysilicon deposition runs were completed in an intermediate size reactor using dichlorosilane fed from 250 pound cylinders. Results from the intermediate size reactor are consistent with those obtained earlier with a small experimental reactor. Modifications of two intermediate size reactors were completed to interface with the dichlorosilane process demonstration unit (PDU). Plahutnik, F. and Arvidson, A. and Sawyer, D. Unspecified Center NASA-CR-169633, NAS 1.26:169633, DOE/JPL-955533-81/7, QPR-7 JPL-955533...

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1)

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) PDF Author: Hemlock Semiconductor Corporation
Publisher:
ISBN:
Category : Chemical processes
Languages : en
Pages : 62

Book Description

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1)

Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) PDF Author: Hemlock Semiconductor Corporation
Publisher:
ISBN:
Category : Chemical processes
Languages : en
Pages : 60

Book Description

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