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Author: Sean Weston Smith Publisher: ISBN: Category : Aluminum oxide Languages : en Pages : 117
Book Description
In the first part of this work, thin films of Al2O3 deposited via atomic layer deposition (ALD) are demonstrated to improve the thermal stability of cellulose nanocrystal (CNC) aerogels. ALD is a chemical vapor deposition (CVD) like method in which sequential precursor exposures and self-limited surface reactions produce a conformal thin film with precise thickness control. The conformal nature of ALD is well suited to coating the porous microstructure of aerogels. SEM micrographs of coating thickness depth profiles are shown to agree with trends predicted by precursor penetration models. Thermogravimetric analysis shows samples coated with ALD Al2O3 have increased decomposition temperatures. In the second part of this work, ALD zinc tin oxide (ZTO) is used to demonstrate a technique for measuring the substrate inhibited growth in multicomponent and laminate ALD systems. The thickness control of ALD makes it attractive for multicomponent and laminate systems. However, the surface reactions of ALD mean that the first few cycles, while the film nucleates, may have a different growth per cycle (GPC) than when the film is growing on itself in a bulk growth regime. A model for the substrate inhibited ALD of ZTO is derived from two complementary sets of laminates. The thickness and composition predictions of our model are tested against the bulk GPC of ZnO and SnO2. In the final part of this work, prompt inorganic condensation (PIC) is explored as a potentially more environmentally friendly alternative to ALD for planar thin film applications. Whereas ALD requires expensive vacuum systems and has low precursor utilization, solution based methods, such as PIC, allow atmospheric processing and precursor recycling. The water based PIC solutions use nitrate counter ions which evaporate at low temperatures. Combined with the low energy required to convert the hydroxide precursor clusters into an oxide film makes PIC a promising low temperature route to dense solution processed thin films. The dielectric performance of PIC Al2O3 is shown to be comparable to ALD Al2O3 films on Si though a large interfacial SiO2 layer is found to be dominating the behavior of the PIC films. This interfacial layer is shown to form very quickly (≤ 2 min) at low temperatures (≤ 50°C). This low temperature interfacial oxide growth could be a benefit in passivating solar cells.
Author: Sean Weston Smith Publisher: ISBN: Category : Aluminum oxide Languages : en Pages : 117
Book Description
In the first part of this work, thin films of Al2O3 deposited via atomic layer deposition (ALD) are demonstrated to improve the thermal stability of cellulose nanocrystal (CNC) aerogels. ALD is a chemical vapor deposition (CVD) like method in which sequential precursor exposures and self-limited surface reactions produce a conformal thin film with precise thickness control. The conformal nature of ALD is well suited to coating the porous microstructure of aerogels. SEM micrographs of coating thickness depth profiles are shown to agree with trends predicted by precursor penetration models. Thermogravimetric analysis shows samples coated with ALD Al2O3 have increased decomposition temperatures. In the second part of this work, ALD zinc tin oxide (ZTO) is used to demonstrate a technique for measuring the substrate inhibited growth in multicomponent and laminate ALD systems. The thickness control of ALD makes it attractive for multicomponent and laminate systems. However, the surface reactions of ALD mean that the first few cycles, while the film nucleates, may have a different growth per cycle (GPC) than when the film is growing on itself in a bulk growth regime. A model for the substrate inhibited ALD of ZTO is derived from two complementary sets of laminates. The thickness and composition predictions of our model are tested against the bulk GPC of ZnO and SnO2. In the final part of this work, prompt inorganic condensation (PIC) is explored as a potentially more environmentally friendly alternative to ALD for planar thin film applications. Whereas ALD requires expensive vacuum systems and has low precursor utilization, solution based methods, such as PIC, allow atmospheric processing and precursor recycling. The water based PIC solutions use nitrate counter ions which evaporate at low temperatures. Combined with the low energy required to convert the hydroxide precursor clusters into an oxide film makes PIC a promising low temperature route to dense solution processed thin films. The dielectric performance of PIC Al2O3 is shown to be comparable to ALD Al2O3 films on Si though a large interfacial SiO2 layer is found to be dominating the behavior of the PIC films. This interfacial layer is shown to form very quickly (≤ 2 min) at low temperatures (≤ 50°C). This low temperature interfacial oxide growth could be a benefit in passivating solar cells.
Author: Aziz Ilmutdinovich Abdulagatov Publisher: ISBN: Category : Atomic layer deposition Languages : en Pages : 313
Book Description
Atomic layer deposition (ALD) and molecular layer deposition (MLD) are advanced thin film coating techniques developed for deposition of inorganic and hybrid organic-inorganic films respectively. Decreasing device dimensions and increasing aspect ratios in semiconductor processing has motivated developments in ALD. The beginning of this thesis will cover study of new ALD chemistry for high dielectric constant Y 2 O3 . In addition, the feasibility of conducting low temperature ALD of TiN and TiAlN is explored using highly reactive hydrazine as a new nitrogen source. Developments of these ALD processes are important for the electronics industry. As the search for new materials with more advanced properties continues, attention has shifted toward exploring the synthesis of hierarchically nanostructured thin films. Such complex architectures can provide novel functions important to the development of state of the art devices for the electronics industry, catalysis, energy conversion and memory storage as a few examples. Therefore, the main focus of this thesis is on the growth, characterization, and post-processing of ALD and MLD films for fabrication of novel composite (nanostructured) thin films. Novel composite materials are created by annealing amorphous ALD oxide alloys in air and by heat treatment of hybrid organic-inorganic MLD films in inert atmosphere (pyrolysis). The synthesis of porous TiO2 or Al2 O3 supported V2 O5 for enhanced surface area catalysis was achieved by the annealing of inorganic TiVx Oy and AlV x Oy ALD films in air. The interplay between phase separation, surface energy difference, crystallization, and melting temperature of individual oxides were studied for their control of film morphology. In other work, a class of novel metal oxide-graphitic carbon composite thin films was produced by pyrolysis of MLD hybrid organic-inorganic films. For example, annealing in argon of titania based hybrid films enabled fabrication of thin films of intimately mixed TiO2 and nanographitized carbon. The graphitized carbon in the film was formed as a result of the removal of hydrogen by pyrolysis of the organic constituency of the MLD film. The presence of graphitic carbon allowed a 14 orders of magnitude increase in the electrical conductivity of the composite material compared fully oxidized rutile TiO2 .
Author: Brian Robert Beatty Publisher: ISBN: Category : Materials science Languages : en Pages : 174
Book Description
Advanced technologies derive many of their capabilities from the advanced materials that they are made from. Complex oxides are a class of materials which are driving technological advancement in a host of di erent directions. These highly functional materials have a great variety of useful properties, which can be chosen and even engineered. Advanced materials require advanced deposition methods. Atomic layer deposition (ALD), a variant of chemical vapor deposition (CVD), is gaining more use in industry for its ability to provide ultra-high lm thickness resolution (down to 0.1 nm), capability to conformally coat three-dimensional structures, and its high uniformity across large surface areas. Additionally, ALD processes provide a possibility to improve economic and environmental viability of the process as compared to CVD by using and wasting less toxic reactants and expelling fewer nano-particulate byproducts. ALD processes are highly mature for many binary oxides commonly used in the semiconductor industries, however processes for depositing heavy metal oxides and complex oxides - oxides containing two or more separate metallic cations - are sorely lacking in literature. The primary focus of this work is the development of a process for depositing the complex perovskite oxide lead titanate (PbTiO3), an end group of the lead zirconate titanate family (PbZrxTi1-xO3), which has valuable technical applications as well as serves as a template for applying this research into other material systems. The author gratefully acknowledges the Army Research O ce (ARO) for their support of this project under the funding provided by Grant # W911NF-08-1-0067.
Author: Babak Anasori Publisher: Springer Nature ISBN: 3030190269 Category : Technology & Engineering Languages : en Pages : 534
Book Description
This book describes the rapidly expanding field of two-dimensional (2D) transition metal carbides and nitrides (MXenes). It covers fundamental knowledge on synthesis, structure, and properties of these new materials, and a description of their processing, scale-up and emerging applications. The ways in which the quickly expanding family of MXenes can outperform other novel nanomaterials in a variety of applications, spanning from energy storage and conversion to electronics; from water science to transportation; and in defense and medical applications, are discussed in detail.
Author: Nicola Pinna Publisher: John Wiley & Sons ISBN: 3527639926 Category : Technology & Engineering Languages : en Pages : 463
Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Author: C.G. Gebelein Publisher: Springer Science & Business Media ISBN: 1461306574 Category : Science Languages : en Pages : 297
Book Description
The term biomimetic is comparatively new on the chemical scene, but the concept has been utilized by chemists for many years. Furthermore, the basic idea of making a synthetic material that can imitate the func tions of natural materials probably could be traced back into antiquity. From the dawn of creation, people have probably attempted to duplicate or modify the activities of the natural world. (One can even find allusions to these attempts in the Bible; e. g. , Genesis 30. ) The term "mimetic" means to imitate or mimic. The word "mimic" means to copy closely, or to imitate accurately. Biomimetic, which has not yet entered most dictionaries, means to imitate or mimic some specific bio logical function. Usually, the objective of biomimetics is to form some useful material without the need of utilizing living systems. In a simi lar manner, the term biomimetic polymers means creating synthetic poly mers which imitate the activity of natural bioactive polymers. This is a major advance in polymer chemistry because the natural bioactive polymers are the basis of life itself. Thus, biomimetic polymers imitate the life process in many ways. This present volume delineates some of the recent progress being made in this vast field of biomimetic polymers. Chemists have been making biomimetic polymers for more than fifty years, although this term wasn't used in the early investigations.
Author: Michel Andre Aegerter Publisher: Springer Science & Business Media ISBN: 0387889531 Category : Technology & Engineering Languages : en Pages : 474
Book Description
Sol-Gel Techniques for Glass Producers and Users provides technological information, descriptions and characterizations of prototypes, or products already on the market, and illustrates advantages and disadvantages of the sol-gel process in comparison to other methods. The first chapter entitled "Wet Chemical Technology" gives a summary of the basic principles of the sol-gel chemistry. The most promising applications are related to coatings. Chapter 2 describes the various "Wet Chemical Coating Technologies" from glass cleaning to many deposition and post-coating treatment techniques. These include patterning of coatings through direct or indirect techniques which have became very important and for which the sol-gel processing is particularly well adapted. Chapter 3 entitled "Bulk Glass Technologies" reports on the preparation of special glasses for different applications. Chapter 4 entitled "Coatings and Materials Properties" describes the properties of the different coatings and the sol-gel materials, fibers and powders. The chapter also includes a section dedicated to the characterization techniques especially applied to sol-gel coatings and products.
Author: Sean Weston Smith
Author: Sean Weston Smith
Author: Aziz Ilmutdinovich Abdulagatov
Author: Matti Putkonen
Author: Jenni Harjuoja
Author: Brian Robert Beatty
Author: Minna Nieminen
Author: Babak Anasori
Author: Nicola Pinna
Author: C.G. Gebelein
Author: Michel Andre Aegerter