Author: Chʻun LiPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 516
Book Description
Design of Multi-filament Arrays and Substrate Holders in Hot-filament CVD Reactors for Large Area Diamond Film Deposition
Author: Chʻun LiPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 516
Book Description
Crystal Growth Technology
Author: K. ByrappaPublisher: Springer Science & Business Media
ISBN: 9783540003670
Category : Science
Languages : en
Pages : 618
Book Description
Crystals are the unacknowledged pillars of modern technology. The modern technological developments depend greatly on the availability of suitable single crystals, whether it is for lasers, semiconductors, magnetic devices, optical devices, superconductors, telecommunication, etc. In spite of great technological advancements in the recent years, we are still in the early stage with respect to the growth of several important crystals such as diamond, silicon carbide, PZT, gallium nitride, and so on. Unless the science of growing these crystals is understood precisely, it is impossible to grow them as large single crystals to be applied in modern industry. This book deals with almost all the modern crystal growth techniques that have been adopted, including appropriate case studies. Since there has been no other book published to cover the subject after the Handbook of Crystal Growth, Eds. DTJ Hurle, published during 1993-1995, this book will fill the existing gap for its readers. The book begins with "Growth Histories of Mineral Crystals" by the most senior expert in this field, Professor Ichiro Sunagawa. The next chapter reviews recent developments in the theory of crystal growth, which is equally important before moving on to actual techniques. After the first two fundamental chapters, the book covers other topics like the recent progress in quartz growth, diamond growth, silicon carbide single crystals, PZT crystals, nonlinear optical crystals, solid state laser crystals, gemstones, high melting oxides like lithium niobates, hydroxyapatite, GaAs by molecular beam epitaxy, superconducting crystals, morphology control, and more. For the first time, the crystal growth modeling has been discussed in detail with reference to PZT and SiC crystals.
Machining and Advanced Manufacturing Technology X
Author: Ying Xue YaoPublisher: Trans Tech Publications Ltd
ISBN: 3038133590
Category : Technology & Engineering
Languages : en
Pages : 602
Book Description
This collection of 142 papers was carefully selected from the more than 300 papers submitted. All of the papers were subjected to peer-review by at least two expert referees.
American Doctoral Dissertations
Author: Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 806
Book Description
Design and Implementation of a Hot Filament Chemical Vapor Deposition System for Diamond Films
Author: Evan L. MorrisonPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 272
Book Description
Design, Construction and Optimization of a Hot Filament Chemical Vapor Deposition Reactor (HFCVD) for Diamond Coating of Cemented Carbide Tool Inserts
Author: Mahmoud Abdelfattah TaherPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 344
Book Description
Construction of an Initiated Chemical Vapor Deposition (iCVD) Reactor and Deposition of Polytetrafluoroethylene (PTFE) Thin Films Using Perfluoro-1-octanesulfonyl Fluoride as the Initiator
Author: Edgar Kiprop KosgeyPublisher:
ISBN:
Category : Chemical reactors
Languages : en
Pages : 132
Book Description
Initiated Chemical Vapor Deposition (iCVD) is a surface polymerization technique that is different from other traditional chemical vapor deposition (CVD) techniques. iCVD is carried under a vacuum without the use of solvents, therefore eliminating contaminations. An initiator and a monomer are metered into a vacuum reactor chamber. Inside the reaction chamber is an array of resistively heated filaments and a cooled substrate stage. Monomer species adsorb on to the cooled substrate surface underneath the filament array. The thermal energy from the resistively heated filaments breaks the bonds in the initiator molecule, generating free radicals. These generated free radicals chemisorb to the monomer initiating an in situ free radical polymerization reaction which results in the formation of a polymer thin film. The overall objective of this research was to assemble a custom-built iCVD reactor and use it to grow polytetrafluoroethylene (PTFE) thin films. Perfluoro-1-octanesulfonyl fluoride (PFOSF) was used as the initiator while hexafluoropropylene oxide (HFPO) was used as the monomer. HPFO is well known for its good thermal decomposition. Nichrome filaments were resistively heated at temperature less than 400 °C and substrate surface cooled between 10 °C and 35 °C. Various characterization techniques such FTIR, XPS, SEM, and EDX were performed on as-deposited iCVD PTFE thin films. FTIR spectra of iCVD PTFE showed that the as-deposited iCVD thin films are spectroscopically identical to bulk PTFE.
Computer Modeling of a Hot-filament Diamond Deposition Reactor
Author: Paul Andrew WashlockPublisher:
ISBN:
Category :
Languages : en
Pages : 162
Book Description
Hot-filament Chemical Vapor Deposition of Selectively Deposited Diamond and Silicone Thin Films
Author: Michael Chiu KwanEvaluation of Surface Modification Technologies for Growing Diamond Films in the Hot Filament Chemical Vapor Deposition System
Author: Mikhail T. GaleevPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 308
Book Description