![Design of Atomospheric [sic] Pressure Plasma CVD Process for Deposition of Silicon Nitride Thin Films Using Dielectric Barrier Discharge PDF](https://books.google.com/books/content/images/frontcover/VKtzXwAACAAJ?fife=w150-h200)
Author: Shunfu HuPublisher:
ISBN:
Category :
Languages : en
Pages : 266
Book Description
Design of Atomospheric [sic] Pressure Plasma CVD Process for Deposition of Silicon Nitride Thin Films Using Dielectric Barrier Discharge
![Design of Atomospheric [sic] Pressure Plasma CVD Process for Deposition of Silicon Nitride Thin Films Using Dielectric Barrier Discharge PDF](https://books.google.com/books/content/images/frontcover/VKtzXwAACAAJ?fife=w80-h100)
Author: Shunfu HuAtmospheric Pressure Deposition of Silicon Nitride Thin Films Using a Dielectric Barrier Discharge as a Plasma Source
Author: Christopher Bruce BlaisPublisher:
ISBN:
Category :
Languages : en
Pages : 290
Book Description
Plasma Deposited Thin Films
Author: MortPublisher: CRC Press
ISBN: 1351092715
Category : Technology & Engineering
Languages : en
Pages : 310
Book Description
In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials DivisionPublisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Characterization of Plasma-Enhanced CVD Processes: Volume 165
Author: Gerald LucovskyPublisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 280
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical Vapour Deposition
Author: Xiu-Tian YanPublisher: Springer Science & Business Media
ISBN: 1848828942
Category : Technology & Engineering
Languages : en
Pages : 352
Book Description
"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.
Plasma Sources for Thin Film Deposition and Etching
Author: Maurice H. FrancombePublisher: Elsevier
ISBN: 9780125330183
Category : Science
Languages : en
Pages : 352
Book Description
Steinbrüchel, Christoph; The formation of particles in thin-film processing plasmas.
Chemical Vapor Deposition for Microelectronics
Author: Arthur ShermanPublisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Handbook of Chemical Vapor Deposition
Author: Hugh O. PiersonPublisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Chemical Vapour Deposition
Author: Anthony C. JonesPublisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket