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Design, Development, and Testing of a Pulsed Laser Deposition System with RHEED Capability

Design, Development, and Testing of a Pulsed Laser Deposition System with RHEED Capability PDF Author: Trevor Delon Brooks
Publisher:
ISBN:
Category : Lasers
Languages : en
Pages : 112

Book Description


Design, Development, and Testing of a Pulsed Laser Deposition System with RHEED Capability

Design, Development, and Testing of a Pulsed Laser Deposition System with RHEED Capability PDF Author: Trevor Delon Brooks
Publisher:
ISBN:
Category : Lasers
Languages : en
Pages : 112

Book Description


Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films PDF Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754

Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Current Research in Pulsed Laser Deposition

Current Research in Pulsed Laser Deposition PDF Author: Liviu Duta
Publisher: MDPI
ISBN: 3036510443
Category : Medical
Languages : en
Pages : 224

Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.

Design and Implementation of Pulsed Laser Deposition System for Thin Film Coating Applications

Design and Implementation of Pulsed Laser Deposition System for Thin Film Coating Applications PDF Author: Tov I. Vestgaarden
Publisher:
ISBN:
Category : Pulsed laser deposition
Languages : en
Pages : 196

Book Description


Digital Control Design and Demonstration for Pulsed Laser Deposition of Superconducting Films

Digital Control Design and Demonstration for Pulsed Laser Deposition of Superconducting Films PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 141

Book Description
The design and implementation of a new Pulsed Laser Deposition system for growing High Temperature Superconducting film at Wright Labs is described and demonstrated. The capabilities of the new system go far beyond the typical laboratory deposition setup. The important system features include real time data acquisition and storage, deposition process automation, and digital control of three key environmental variables, specifically the laser energy, substrate temperature, and chamber oxygen pressure. It is hoped that process repeatibility can be achieved through control of these environmental variables. Additional in situ measurements on plume characteristics should help increase the understanding of the PLD process in general. The effectiveness of the new system is demonstrated by the successful growth of superconducting films.

Digital Control System Design and Demonstration for Pulsed Laser Deposition of Superconducting Films

Digital Control System Design and Demonstration for Pulsed Laser Deposition of Superconducting Films PDF Author: Steven P. Murray
Publisher:
ISBN:
Category :
Languages : en
Pages : 264

Book Description


Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films PDF Author: Douglas B. Chrisey
Publisher: Wiley-Interscience
ISBN: 9780471592181
Category : Technology & Engineering
Languages : en
Pages : 0

Book Description
A comprehensive overview of what is required to set up and begin research in this newly developing technology and understand the basics of the process. Internationally recognized experts in their fields cover such fundamentals as history, theory, film characteristics, surface modification, laser technology, materials and applications including excellent reviews regarding the entire areas of semiconductor buffer layers, thin-film ferroelectrics and ferrites along with the work involving films deposited by PLD.

Advanced Pulsed Laser Deposition System with In-Situ Ellipsometric Diagnostics

Advanced Pulsed Laser Deposition System with In-Situ Ellipsometric Diagnostics PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

Book Description
The proposal described and requested funding for part of what is intended to become a larger system representing an optics-based research facility for ultrafast pulsed laser deposition and characterization of modulated films, coatings, and surface structures. An in-situ diagnostics approach is used as a process control, through real-time feedback, in manufacturing multilayer thin films and coatings. Experimental facilities employing optical techniques, in conjunction with other more conventional particle monitoring and control methods, provides new and advanced capability, as well as greater insight, into complex thin-film fabrication. Such insight has been, and continues to be, demanded by sophisticated industrial and government end users. The present program is aimed at establishing a multi-port pulsed laser vacuum deposition chamber with an in-situ multi-wavelength ellipsometer to be used as an optical diagnostic and feedback control device. This system will be attached to a versatile high average power ultrafast pulsed laser for the experimental development and fabrication of modulated thin-film materials and multilayers. It is intended to be a collaborative and interdisciplinary research facility set up at the Center for Ultrafast Optical Science at the University of Michigan.

Development of a Pulsed-laser Technique for Thin Film Deposition

Development of a Pulsed-laser Technique for Thin Film Deposition PDF Author: David J. Uhl
Publisher:
ISBN:
Category : Materials science
Languages : en
Pages : 76

Book Description
The majority of nanotechnology-related research at the CSCU-CNT at Southern Connecticut State University involves depositing thin films of controlled thicknesses using a thermal physical vapor deposition method. The thermal evaporative method, however, is limited to the deposition of single transition metals with low melting points. This project greatly expands the scope of available materials for deposition through the development and implementation of a pulsed-laser deposition technique. A solid state, Nd:YAG, Q-switched laser from 1989 was restored and aligned, and a 3-dimensional CAD model of the high vacuum chamber was produced to aid in the configuration of the system. The power output of the laser beam was monitored using a digital intensity readout; the beam reached a maximum power of 2 Watts. Three target elements were selected for deposition onto a Silicon substrate in order to test the efficiency of the system. Copper, Iron, and Tantalum samples were exposed to the beam under vacuum for 5 minutes. The Silicon substrates were imaged under a scanning electron microscope. The images demonstrate successful depositions. This development has greatly widened the scope of materials available for thin film deposition, subsequently impacting future research at the CSCU-CNT in the field of nanotechnology.

Development of Advanced Pulsed-laser Deposition and Application to Functional Materials

Development of Advanced Pulsed-laser Deposition and Application to Functional Materials PDF Author: 嚴治平
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description