Author: Aditi Banerjee
Publisher:
ISBN:
Category :
Languages : en
Pages : 344
Book Description
Remote Plasma Enhanced Chemical Vapor Deposition of Silicon Based Dielectrics
Deposition of Silicon Based Dielectrics by Remote Plasma Enhanced Chemical Vapor Deposition
Deposition of Amorphous Silicon and Silicon Based Dielectrics by Remote Plasma Enhanced Chemical Vapor Deposition
Growth and Characterization of Silicon-based Dielectrics Using Plasma Enhanced Chemical Vapor Deposition
Author: Daniel J. Carbaugh
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages :
Book Description
Surface Reactions During Plasma Enhanced Chemical Vapor Deposition of Silicon and Silicon Based Dielectrics
Author: Atul Gupta
Publisher:
ISBN:
Category :
Languages : en
Pages : 163
Book Description
Keywords: Plasma deposition, Surface chemistry, Ab-initio calculations, Reaction mechanisms, Kinetics, Amorphous silicon, Silicon dioxide.
Publisher:
ISBN:
Category :
Languages : en
Pages : 163
Book Description
Keywords: Plasma deposition, Surface chemistry, Ab-initio calculations, Reaction mechanisms, Kinetics, Amorphous silicon, Silicon dioxide.
Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition
Plasma-enhanced Chemical Vapor Deposition of Silicon Dioxide
Author: Arjen Boogaard
Publisher:
ISBN: 9789036531306
Category :
Languages : en
Pages : 186
Book Description
Publisher:
ISBN: 9789036531306
Category :
Languages : en
Pages : 186
Book Description
Chemical Vapor Deposition for Microelectronics
Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Remote plasma enhanced chemical vapor deposition of silicon on silicon
Author: Brian George Anthony
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 172
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 172
Book Description