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Author: Olena Fesenko Publisher: Springer Nature ISBN: 3030519058 Category : Science Languages : en Pages : 763
Book Description
This book highlights some of the latest advances in nanotechnology and nanomaterials from leading researchers in Ukraine, Europe and beyond. It features contributions presented at the 7th International Science and Practice Conference Nanotechnology and Nanomaterials (NANO2019), which was held on August 27–30, 2019 at Lviv Polytechnic National University, and was jointly organized by the Institute of Physics of the National Academy of Sciences of Ukraine, University of Tartu (Estonia), University of Turin (Italy), and Pierre and Marie Curie University (France). Internationally recognized experts from a wide range of universities and research institutions share their knowledge and key findings on material properties, behavior, and synthesis. This book’s companion volume also addresses topics such as nano-optics, energy storage, and biomedical applications.
Author: Olena Fesenko Publisher: Springer Nature ISBN: 3030519058 Category : Science Languages : en Pages : 763
Book Description
This book highlights some of the latest advances in nanotechnology and nanomaterials from leading researchers in Ukraine, Europe and beyond. It features contributions presented at the 7th International Science and Practice Conference Nanotechnology and Nanomaterials (NANO2019), which was held on August 27–30, 2019 at Lviv Polytechnic National University, and was jointly organized by the Institute of Physics of the National Academy of Sciences of Ukraine, University of Tartu (Estonia), University of Turin (Italy), and Pierre and Marie Curie University (France). Internationally recognized experts from a wide range of universities and research institutions share their knowledge and key findings on material properties, behavior, and synthesis. This book’s companion volume also addresses topics such as nano-optics, energy storage, and biomedical applications.
Author: Peter M. Martin Publisher: William Andrew ISBN: 0815520328 Category : Technology & Engineering Languages : en Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author: Donald M. Mattox Publisher: William Andrew ISBN: 0128130857 Category : Technology & Engineering Languages : en Pages : 383
Book Description
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating
Author: Cheol Seong Hwang Publisher: Springer Science & Business Media ISBN: 146148054X Category : Science Languages : en Pages : 266
Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Professor K.S. K.S Sree Harsha Publisher: Elsevier ISBN: 0080480314 Category : Technology & Engineering Languages : en Pages : 1173
Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author: P. A. Dearnley Publisher: Cambridge University Press ISBN: 1316785084 Category : Technology & Engineering Languages : en Pages : 798
Book Description
This highly illustrated reference work covers the three principal types of surface technologies that best protect engineering devices and products: diffusion technologies, deposition technologies, and other less commonly acknowledged surface engineering (SE) techniques. Various applications are noted throughout the text and additionally whole chapters are devoted to specific SE applications across the automotive, gas turbine engine (GTE), metal machining, and biomedical implant sectors. Along with the benefits of SE, this volume also critically examines SE's limitations. Materials degradation pathways - those which can and those which cannot be mitigated by SE - are rigorously explained. Written from a scientific, materials engineering perspective, this concise text is supported by high-quality images and photo-micrographs which show how surfaces can be engineered to overcome the limits of conventionally produced materials, even in complex or hostile operating environments. This book is a useful resource for undergraduate and postgraduate students as well as professional engineers.
Author: Hugh O. Pierson Publisher: William Andrew ISBN: Category : Science Languages : en Pages : 376
Book Description
The main objective of this book is to: (1) provide a complete review of the structures and properties of refractory carbides and nitrides; (2) provide a thorough assessment of the technology, processing, and equipment and systems used in production and R&D, with emphasis on advanced designs; and (3) identify and describe the applications, particularly new and emerging areas.
Author: Olena Fesenko
Author: Olena Fesenko
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Author: Peter M. Martin
Author: Donald M. Mattox
Author: Cheol Seong Hwang
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Author: Professor K.S. K.S Sree Harsha
Author: P. A. Dearnley
Author: Hugh O. Pierson