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Author: S. Ashok Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 522
Book Description
This book focuses on the deliberate introduction and manipulation of defects and impurities in order to engineer desired properties in semiconductor materials and devices. In view of current exciting developments in wide-bandgap semiconductors like GaN for blue light emission, as well as high-speed and high-temperature electronics, dopant and defect issues relevant to these materials are addressed. Also featured are semiconductor nanocavities and nano-structures, with emphasis on the formation and impact of vacancy-type defects. Defect reaction problems pertaining to impurity gettering, precipitation and hydrogen passivation are specific examples of defect engineering that improve the electronic quality of the material. A number of papers also deal with characterization techniques needed to study and to identify defects in materials and device structures. Finally, papers also address issues such as interface control and passivation, application of ion implantation, plasma treatment and rapid thermal processing for creating/activating/suppressing trap levels, and device applications.
Author: S. Ashok Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 522
Book Description
This book focuses on the deliberate introduction and manipulation of defects and impurities in order to engineer desired properties in semiconductor materials and devices. In view of current exciting developments in wide-bandgap semiconductors like GaN for blue light emission, as well as high-speed and high-temperature electronics, dopant and defect issues relevant to these materials are addressed. Also featured are semiconductor nanocavities and nano-structures, with emphasis on the formation and impact of vacancy-type defects. Defect reaction problems pertaining to impurity gettering, precipitation and hydrogen passivation are specific examples of defect engineering that improve the electronic quality of the material. A number of papers also deal with characterization techniques needed to study and to identify defects in materials and device structures. Finally, papers also address issues such as interface control and passivation, application of ion implantation, plasma treatment and rapid thermal processing for creating/activating/suppressing trap levels, and device applications.
Author: S. Ashok Publisher: Cambridge University Press ISBN: 9781558994164 Category : Technology & Engineering Languages : en Pages : 0
Book Description
The evolution of semiconductor devices of progressively higher performance has generally followed improved material quality with ever fewer defect concentrations. However, a shift in focus over the years has brought the realization that complete elimination of defects in semiconductors during growth and processing is neither desirable nor necessary. It is expected that the future role of defects in semiconductors will be one of control - in density, properties, spatial location, and perhaps even temporal variation during the operating lifetime of the device. This book explores the effective use of defect control at various facets of technology and widely different semiconductor materials systems. Topics include: grown-in defects in bulk crystals; doping issues; grown-in defects in thin films; doping and defect issues in wide-gap semiconductors; process-induced defects and gettering; defect properties, reactions, activation and passivation; ion implantation and irradiation effects; defects in devices and interfaces; plasma processing; defect characterization; and interfaces, quantum wells and superlattices.
Author: Bernd O. Kolbesen Publisher: The Electrochemical Society ISBN: 9781566773485 Category : Technology & Engineering Languages : en Pages : 572
Book Description
.".. ALTECH 2003 was Symposium J1 held at the 203rd Meeting of the Electrochemical Society in Paris, France from April 27 to May 2, 2003 ... Symposium M1, Diagnostic Techniques for Semiconductor Materials and Devices, was part of the 202nd Meeting of the Electrochemical Society held in Salt Lake City, Utah, from October 21 to 25, 2002 ..."--p. iii.
Author: Peter Pichler Publisher: Springer Science & Business Media ISBN: 3709105978 Category : Technology & Engineering Languages : en Pages : 576
Book Description
This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.
Author: Materials Research Society. Meeting Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 596
Book Description
Defects such as dislocations, antiphase domains and grain boundaries, interstitials/substitutionals, and vacancies affect many physical and mechanical properties of ordered intermetallics. As a result, they often play a decisive role in determining the macroscopic behavior of not just structural intermetallics but also 'functional' intermetallics such as shape memory alloys and hydrogen storage materials. This book follows in the general tradition of the highly successful series of MRS symposia titled High-Temperature Ordered Intermetallic Alloys. However, it also represents a significant departure from its predecessors: it includes papers on functional intermetallics in addition to papers on structural intermetallics; and focuses on defects and how they affect various properties of interest in structural and functional intermetallics. Roughly 30 percent of the papers in the book are on functional intermetallics, including materials for hydrogen storage, magnetic, and shape memory applications. The remaining papers deal with structural intermetallics, including the still active areas of nickel-, iron-, and titanium-aluminides, as well as the newer materials for ultrahigh-temperature applications.
Author: M.O. Manasreh Publisher: Elsevier ISBN: 0080534449 Category : Science Languages : en Pages : 463
Book Description
Research advances in III-nitride semiconductor materials and device have led to an exponential increase in activity directed towards electronic and optoelectronic applications. There is also great scientific interest in this class of materials because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. The volume consists of chapters written by a number of leading researchers in nitride materials and device technology with the emphasis on the dopants incorporations, impurities identifications, defects engineering, defects characterization, ion implantation, irradiation-induced defects, residual stress, structural defects and phonon confinement. This unique volume provides a comprehensive review and introduction of defects and structural properties of GaN and related compounds for newcomers to the field and stimulus to further advances for experienced researchers. Given the current level of interest and research activity directed towards nitride materials and devices, the publication of the volume is particularly timely. Early pioneering work by Pankove and co-workers in the 1970s yielded a metal-insulator-semiconductor GaN light-emitting diode (LED), but the difficulty of producing p-type GaN precluded much further effort. The current level of activity in nitride semiconductors was inspired largely by the results of Akasaki and co-workers and of Nakamura and co-workers in the late 1980s and early 1990s in the development of p-type doping in GaN and the demonstration of nitride-based LEDs at visible wavelengths. These advances were followed by the successful fabrication and commercialization of nitride blue laser diodes by Nakamura et al at Nichia. The chapters contained in this volume constitutes a mere sampling of the broad range of research on nitride semiconductor materials and defect issues currently being pursued in academic, government, and industrial laboratories worldwide.
Author: Steven C. Tidrow Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 232
Book Description
Challenges facing the implementation of an affordable tunable RF and microwave device technology are discussed in these papers from an April 2002 meeting. Materials issues and devices are examined, with information on new tunable materials, issues of preparation and optimization of bulk and think film properties, material and surface characterization, evaluation of material loss and loss mechanisms, and effects of microstructure. At the device level, phase shifters are discussed and a new device concept for variable true time delay versus phase shift is introduced. At the system level, a paraelectric lens is used to demonstrate electronic beam steering of an antenna. Tidrow is affiliated with the US Army Research Laboratory. Annotation copyrighted by Book News, Inc., Portland, OR
Author: T. M. Orlando Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 320
Book Description
Advances in nanoscale materials processing are taking place at a rapid pace via myriad paths, including lithography, production of nanoparticle assemblies, surface manipulation and many others. Several of the techniques create structures that are three-dimensional or quasi three-dimensional. Even smaller structures intended to be two-dimensional have a 'more' three-dimensional geometry as their two-dimensional feature size and layer thickness become similar. The properties of these denser assemblies are driving different applications in electronics (single-electron devices), optics (photonic crystals and switches) and elsewhere. This 2003 book provides a venue for a productive scientific and technical exchange. The result is a compilation of papers which address fundamental studies, technological advances and novel approaches to developing and processing three-dimensional nanoscale assemblies. Topics include: nanofabrication via lithographic techniques; unconventional fabrication methods of nano-structures; physics, chemistry and modeling of nanostructures; fabrication and properties of 1D nanostructures; fabrication and properties of 3D nanostructures; applications of nanostructures and devices.
Author: S. Ashok
Author: S. Ashok
Author: 
Author: S. Ashok
Author: Bernd O. Kolbesen
Author: Peter Pichler
Author: Materials Research Society. Meeting
Author: M.O. Manasreh
Author: Steven C. Tidrow
Author: T. M. Orlando
Author: