![Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition PDF](https://books.google.com/books/content/images/frontcover/MpbKpwAACAAJ?fife=w80-h100)
Author: Rong-Zhen QianPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 396
Book Description
Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition
Author: Rong-Zhen QianPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 396
Book Description
Characterization and reduction of defects in epitaxial Si and Si[subscript 1-x] Ge[subscript x]/Si films grown by remote plasma-enhanced chemical vapor deposition
![Characterization and reduction of defects in epitaxial Si and Si[subscript 1-x] Ge[subscript x]/Si films grown by remote plasma-enhanced chemical vapor deposition PDF](https://books.google.com/books/content/images/frontcover/aJTVpwAACAAJ?fife=w80-h100)
Author: David Stephen KinoskyPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 244
Book Description
In situ B-doped Si epitaxial films grown by remote plasma-enhanced chemical vapor deposition
Author: Joel Thornton IrbyPublisher:
ISBN:
Category : Silicon
Languages : en
Pages : 118
Book Description
Characterization of the electrical properties of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition
Author: Rajan SharmaIn situ P-doped epitaxial films grown by remote plasma-enhanced chemical vapor deposition
Author: Sunil ThomasPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 158
Book Description
Improving the electrical properties of in situ doped silicon films grown by remote plasma-enhanced chemical vapor deposition
Author: Pablo MunguiaMicrostructural characterization of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition
Author: Ting-Chen HsuPublisher:
ISBN:
Category : Microstructure
Languages : en
Pages : 230
Book Description
Characterization of Epitaxial Semiconductor Films
Author: Henry KresselPublisher: Elsevier Science & Technology
ISBN:
Category : Science
Languages : en
Pages : 236
Book Description
Ge[subscript x]Si[subscript 1-x] epitaxial layers grown by rapid thermal processing chemical vapor deposition
![Ge[subscript x]Si[subscript 1-x] epitaxial layers grown by rapid thermal processing chemical vapor deposition PDF](https://books.google.com/books/content/images/frontcover/d6D8pwAACAAJ?fife=w80-h100)
Author: Kim Hsi-I JungPublisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 118
Book Description
Plasma Deposition of Amorphous Silicon-Based Materials
Author: Pio CapezzutoPublisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339
Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices