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Computer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films

Computer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 76

Book Description
The goals of this project are: 1) the development of a new method for the fabrication of superconducting oxide thin films, viz computer controlled ion beam sputter deposition; and 2) the fabrication of YBa2Cu3O(7-delta) thin films and devices using this method. In the early stage of the project it was demonstrated that the use of complex multicomponent sputter targets (such as ceramic YBa2Cu3O7-delta) present significant problems for compositional control. The new computer-controlled ion beam sputter deposition system was developed. The key features include: 1) a rotatable target holder assembly, which serves to position elemental targets under the ion beam in a rapid sequence, 2) a primary ion beam to produce a sputtered flux from the targets, 3) a secondary oxygen beam (ionic, atomic, or reactive oxygen (ozone)) to oxygenate the film and lower the required deposition temperature, 4) complete computer interfacing to provide real time feedback on the thickness of the depositing species and control of the above items. In terms of the superconductor device objectives, the system is designed to allow for low temperature deposition for integrated devices, compositional control and flexibility, and for scaling to a commercial system. The capability of the system for controlled sequential deposition of layered structures is fundamental for the production of heterostructures and sandwich junctions (superconductor-insulator-superconductor and superconductor-normal-superconductor). This is demanding due to the short coherence lengths in the oxide superconductors.

Computer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films

Computer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 76

Book Description
The goals of this project are: 1) the development of a new method for the fabrication of superconducting oxide thin films, viz computer controlled ion beam sputter deposition; and 2) the fabrication of YBa2Cu3O(7-delta) thin films and devices using this method. In the early stage of the project it was demonstrated that the use of complex multicomponent sputter targets (such as ceramic YBa2Cu3O7-delta) present significant problems for compositional control. The new computer-controlled ion beam sputter deposition system was developed. The key features include: 1) a rotatable target holder assembly, which serves to position elemental targets under the ion beam in a rapid sequence, 2) a primary ion beam to produce a sputtered flux from the targets, 3) a secondary oxygen beam (ionic, atomic, or reactive oxygen (ozone)) to oxygenate the film and lower the required deposition temperature, 4) complete computer interfacing to provide real time feedback on the thickness of the depositing species and control of the above items. In terms of the superconductor device objectives, the system is designed to allow for low temperature deposition for integrated devices, compositional control and flexibility, and for scaling to a commercial system. The capability of the system for controlled sequential deposition of layered structures is fundamental for the production of heterostructures and sandwich junctions (superconductor-insulator-superconductor and superconductor-normal-superconductor). This is demanding due to the short coherence lengths in the oxide superconductors.

A Novel Computer-controlled Single Ion Beam Multi-target Sputter Deposition System for Y-Ba-Cu-O High TC Superconducting Thin Films

A Novel Computer-controlled Single Ion Beam Multi-target Sputter Deposition System for Y-Ba-Cu-O High TC Superconducting Thin Films PDF Author: Ying-Li Liu
Publisher:
ISBN:
Category : Sputtering (Physics)
Languages : en
Pages : 470

Book Description


Scientific and Technical Aerospace Reports

Scientific and Technical Aerospace Reports PDF Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 652

Book Description


Computer Simulation of Scattered Ion and Sputtered Species Effects in Ion Beam Sputter-deposition of High Temperature Superconducting Thin Films

Computer Simulation of Scattered Ion and Sputtered Species Effects in Ion Beam Sputter-deposition of High Temperature Superconducting Thin Films PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10

Book Description
Ion beam sputter-deposition is a technique currently used by many groups to produce single and multicomponent thin films. This technique provides several advantages over other deposition methods, which include the capability for yielding higher film density, accurate stoichiometry control, and smooth surfaces. However, the relatively high kinetic energies associated with ion beam sputtering also lead to difficulties if the process is not properly controlled. Computer simulations have been performed to determine net deposition rates, as well as the secondary erosion, lattice damage, and gas implantation in the films, associated with primary ions scattered from elemental Y, Ba and Cu targets used to produce high temperature superconducting Y-Ba-Cu-O films. The simulations were performed using the TRIM code for different ion masses and kinetic energies, and different deposition geometries. Results are presented for primary beams of Ar, Kr and Xe incident on Ba and Cu targets at 0° and 45° with respect to the surface normal, with the substrate positioned at 0° and 45°. The calculations indicate that the target composition, mass and kinetic energy of the primary beam, angle of incidence on the target, and position and orientation of the substrate affect the film damage and trapped primary beam gas by up to 5 orders of magnitude.

Reactive Ion Beam Sputter Deposition of High Temperature Superconducting Cuprate Oxide Thin Films

Reactive Ion Beam Sputter Deposition of High Temperature Superconducting Cuprate Oxide Thin Films PDF Author: Clifford Norman Soble
Publisher:
ISBN:
Category :
Languages : en
Pages : 252

Book Description


Energy Research Abstracts

Energy Research Abstracts PDF Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 852

Book Description


Surface Processing and Laser Assisted Chemistry

Surface Processing and Laser Assisted Chemistry PDF Author: E. Fogarassy
Publisher: Elsevier
ISBN: 0444596682
Category : Science
Languages : en
Pages : 495

Book Description
The papers in this volume cover all aspects of laser assisted surface processing ranging from the preparation of high-Tc superconducting layer structures to industrial laser applications for device fabrication. The topics presented give recent results in organometallic chemistry and laser photochemistry, and novel surface characterization techniques. The ability to control the surface morphology by digital deposition and etching shows one of the future directions for exciting applications of laser surface processing, some of which may apply UV and VUV excitation. The understanding of elementary proceses is essential for the design of novel deposition methods, with diamond CVD being an outstanding example. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry.

Beam-Solid Interactions:: Volume 157

Beam-Solid Interactions:: Volume 157 PDF Author: James A. Knapp
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 912

Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Thin Film Processing:Hi-Tc Superconductors.AVS Series 3

Thin Film Processing:Hi-Tc Superconductors.AVS Series 3 PDF Author: James M. E. Harper
Publisher: American Institute of Physics
ISBN:
Category : Science
Languages : en
Pages : 498

Book Description
Addresses the importance of these surfaces in establishing the pairing mechanisms responsible for superconductivity. Discussions include evaporation, sputtering, laser ablation, the effects of substrates and surface and interface chemistry on superconducting films, and the characterization of these

Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices

Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices PDF Author: O. Auciello
Publisher: Springer Science & Business Media
ISBN: 9401117276
Category : Technology & Engineering
Languages : en
Pages : 625

Book Description
The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.