Computational heat and mass transfer – CHMT 2001- Vol.II PDF Download

Author:
Publisher: Editora E-papers
ISBN: 8587922459
Category :
Languages : en
Pages : 369

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Author:
Publisher: Editora E-papers
ISBN: 8587922440
Category :
Languages : en
Pages : 413

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Author: United States. Joint Chiefs of Staff
Publisher:
ISBN:
Category : Military art and science
Languages : en
Pages : 392

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Author: Christopher Corti
Publisher: CRC Press
ISBN: 1420065262
Category : Science
Languages : en
Pages : 446

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Gold is used in a wide range of industrial and medical applications and accounts for over 10 percent of the annual demand for metal, worth billions of dollars annually. While much has been written about the mystique and trade of gold, very little has been written about the science and technology in which it is involved. Edited by two respected auth

Author: Stefan Lindenmeier
Publisher: Springer Science & Business Media
ISBN: 3642183751
Category : Technology & Engineering
Languages : en
Pages : 378

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This volume provides a discussion of the challenges and perspectives of electromagnetics and network theory and their microwave applications in all aspects. It collects the most interesting contribution of the symposium dedicated to Professor Peter Russer held in October 2009 in Munich.

Author: Rao Tummala
Publisher: McGraw Hill Professional
ISBN: 0071500596
Category : Technology & Engineering
Languages : en
Pages : 979

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LEARN ABOUT MICROSYSTEMS PACKAGING FROM THE GROUND UP Written by Rao Tummala, the field’s leading author, Fundamentals of Microsystems Packaging is the only book to cover the field from wafer to systems, including every major contributing technology. This rigorous and thorough introduction to electronic packaging technologies gives you a solid grounding in microelectronics, photonics, RF, packaging design, assembly, reliability, testing, and manufacturing and its relevance to both semiconductors and systems. You’ll find: *Full coverage of electrical, mechanical, chemical, and materials aspects of each technology *Easy-to-read schematics and block diagrams *Fundamental approaches to all system issues *Examples of all common configurations and technologies—wafer level packaging, single chip, multichip, RF, opto-electronic, microvia boards, thermal and others *Details on chip-to-board connections, sealing and encapsulation, and manufacturing processes *Basics of electrical and reliability testing

Author: Leslie Green
Publisher:
ISBN: 9780955506406
Category : Analog electronic systems
Languages : en
Pages : 578

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This textbook has been written by a practicing professional electronics design engineer for the following specific groups: 1. Final year students in electronic engineering and related subjects. 2. Final year physics students taking an electronics option. 3. Junior design engineers who seek rapid career progression. 4. Mature digital designers who seek a broader skill set, to include real-world interfaces, measurements and other analog skills.

Author: Tapan Gupta
Publisher: Springer Science & Business Media
ISBN: 1441900764
Category : Technology & Engineering
Languages : en
Pages : 433

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Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials is now prevalent in the international microelectronics industry. As the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.

Author: K. L. Mittal
Publisher: Springer Science & Business Media
ISBN: 146843506X
Category : Science
Languages : en
Pages : 530

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The present volume and its companion Volume 2 document the proceedings of the Symposium on Surface Contamination: Its Genesis, Detection and Control held in Washington, D.C., September 10-13, 1978. This Symposium was a part of the 4th International Symposium on Contamination Control held under the auspices of the International Committee of Contamination Control Societies, and the Institute of Environmental Sciences (U.S.A.) was the official host. The ubiquitous nature of surface contamination causes concern to everyone dealing with surfaces, and the world of surfaces is wide and open-ended. The technological areas where surface clean ing is of cardinal importance are too many and very diversified. To people working in areas such as adhesion, composites, adsorp tion, friction, lubrication, soldering,device fabrication, printed circuit boards, etc., surface contamination has always been a bete noire. In short, people dealing with surfaces are afflicted with molysmophobiat, and rightfully so. In the past, the subject of surface contamination had been discussed in various meetings, but this symposium was hailed as the most comprehensive symposium ever held on this important topic, as the technical program comprised 70 papers by more than 100 authors from 10 countries. The symposium was truly international in scope and spirits and was very well attended. The attendees represented a broad spectrum of backgrounds, interests, and pro fessional affiliations, but all had a common interest and concern about surface contamination and cleaning.

Author: Yogesh Jaluria
Publisher: Routledge
ISBN: 1351458868
Category : Science
Languages : en
Pages : 568

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This new edition updated the material by expanding coverage of certain topics, adding new examples and problems, removing outdated material, and adding a computer disk, which will be included with each book. Professor Jaluria and Torrance have structured a text addressing both finite difference and finite element methods, comparing a number of applicable methods.