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Author: Neha Agarwal Publisher: LAP Lambert Academic Publishing ISBN: 9783659246876 Category : Languages : en Pages : 56
Book Description
Double gate MOSFET is widely used for sub-50nm technology of transistor design .They have immunity to short channel effects, reduced leakage current and high scaling potential. The single gate Silicon-on-insulator (SOI) devices give improved circuit speed and power consumption .But as the transistor size is reduced the close proximity between source and drain reduces the ability of the gate electrode to control the flow of current and potential distribution in the channel. To reduce SCE we need increase gate to channel coupling with respect to source/drain to channel coupling. This book presents the compact modeling of long channel undoped and doped symmetric double-gate MOSFET. The formulation starts with the solution of Poisson's equation which is then coupled to the Pao-Sah current equation to obtain the analytical drain-current model in terms of carrier concentration. The performance analysis of both the doped and undoped body symmetric DGMOS is done by using the model . Comparison of the two types of DGMOS is also done on the basis their electrical characteristics.
Author: Neha Agarwal Publisher: LAP Lambert Academic Publishing ISBN: 9783659246876 Category : Languages : en Pages : 56
Book Description
Double gate MOSFET is widely used for sub-50nm technology of transistor design .They have immunity to short channel effects, reduced leakage current and high scaling potential. The single gate Silicon-on-insulator (SOI) devices give improved circuit speed and power consumption .But as the transistor size is reduced the close proximity between source and drain reduces the ability of the gate electrode to control the flow of current and potential distribution in the channel. To reduce SCE we need increase gate to channel coupling with respect to source/drain to channel coupling. This book presents the compact modeling of long channel undoped and doped symmetric double-gate MOSFET. The formulation starts with the solution of Poisson's equation which is then coupled to the Pao-Sah current equation to obtain the analytical drain-current model in terms of carrier concentration. The performance analysis of both the doped and undoped body symmetric DGMOS is done by using the model . Comparison of the two types of DGMOS is also done on the basis their electrical characteristics.
Author: Huaxin Lu Publisher: ISBN: Category : Languages : en Pages : 143
Book Description
Double-Gate (DG) MOSFET is a newly emerging device that can potentially further scale down CMOS technology owing to its excellent control of short channel effects. Currently, much research effort is devoted to the development of DG MOSFETs. This dissertation focuses on the compact modeling of DG MOSFETs, aiming to extract the physics of DG MOSFETs and provide a tool for simulating DG MOSFET circuits. We start from the basic Poisson's equation and current continuity equation to rigorously derive the long-channel drain current model without the charge sheet approximation. The model is based on an analytical solution to the potential distribution at any point in the DG MOSFET. It employs one single equation to cover all the operation regions: linear, saturation, and subthreshold, continuously with no fitting parameter. Volume inversion, a non-charge-sheet phenomenon in symmetric DG MOSFETs, is accurately captured by the model. For AC and transient simulations, analytical charge and capacitance models are developed. Both symmetric and asymmetric DG MOSFET models are verified by extensive two dimensional numerical simulations. For small-geometry devices, compact models of the physical phenomena such as short channel effects are developed. In the development of the compact models, special attention is paid to ensure the model is symmetric and continuous in all the operation regions. Quantum effect is also incorporated in the long channel core model. As body doping may be needed to adjust the threshold voltage, we also studied the body doping effect on DG MOSFET and concluded that lightly doped DG MOSFETs can be modeled by adding a threshold voltage shift to the undoped DG MOSFET model. The model has been implemented into SPICE3 and Verilog-A platforms so that it can be used by circuit designers. In the implementation, Newton method is used for solving an implicit equation in the calculation of drain current. We also calibrated the model with respect to the published hardware data to affirm its consistency with the experimental I-V curves. Finally, the model has been released in public domain http://taur.ucsd.edu/~hlu for circuit simulation.
Author: Gennady Gildenblat Publisher: Springer Science & Business Media ISBN: 9048186145 Category : Technology & Engineering Languages : en Pages : 531
Book Description
Most of the recent texts on compact modeling are limited to a particular class of semiconductor devices and do not provide comprehensive coverage of the field. Having a single comprehensive reference for the compact models of most commonly used semiconductor devices (both active and passive) represents a significant advantage for the reader. Indeed, several kinds of semiconductor devices are routinely encountered in a single IC design or in a single modeling support group. Compact Modeling includes mostly the material that after several years of IC design applications has been found both theoretically sound and practically significant. Assigning the individual chapters to the groups responsible for the definitive work on the subject assures the highest possible degree of expertise on each of the covered models.
Author: Wei Wang Publisher: ISBN: 9781109906974 Category : Languages : en Pages : 145
Book Description
As CMOS scales down to the limits imposed by oxide tunneling and voltage non-scaling, double-gate (DG) MOSFET has become a subject of intense VLSI research. In this dissertation, quantum effects were investigated in both long channel and short channel Double-Gate MOSFETs.
Author: Carlos Galup-Montoro Publisher: World Scientific ISBN: 9812568107 Category : Technology & Engineering Languages : en Pages : 445
Book Description
This is the first book dedicated to the next generation of MOSFET models. Addressed to circuit designers with an in-depth treatment that appeals to device specialists, the book presents a fresh view of compact modeling, having completely abandoned the regional modeling approach.Both an overview of the basic physics theory required to build compact MOSFET models and a unified treatment of inversion-charge and surface-potential models are provided. The needs of digital, analog and RF designers as regards the availability of simple equations for circuit designs are taken into account. Compact expressions for hand analysis or for automatic synthesis, valid in all operating regions, are presented throughout the book. All the main expressions for computer simulation used in the new generation compact models are derived.Since designers in advanced technologies are increasingly concerned with fluctuations, the modeling of fluctuations is strongly emphasized. A unified approach for both space (matching) and time (noise) fluctuations is introduced.
Author: Amara Amara Publisher: Springer Science & Business Media ISBN: 1402093411 Category : Technology & Engineering Languages : en Pages : 215
Book Description
Until the 1990s, the reduction of the minimum feature sizes used to fabricate in- grated circuits, called “scaling”, has highlighted serious advantages as integration density, speed, power consumption, functionality and cost. Direct consequence was the decrease of cost-per-function, so the electronic productivity has largely progressed in this period. Another usually cited trend is the evolution of the in- gration density as expressed by the well-know Moore’s Law in 1975: the number of devices per chip doubles every 2 years. This evolution has allowed improving signi?cantly the circuit complexity, offering a great computing power in the case of microprocessor, for example. However, since few years, signi?cant issues appeared such as the increase of the circuit heating, device complexity, variability and dif?culties to improve the integration density. These new trends generate an important growth in development and production costs. Though is it, since 40 years, the evolution of the microelectronics always f- lowed the Moore’s law and each dif?culty has found a solution.
Author: Samar K. Saha Publisher: CRC Press ISBN: 1351831070 Category : Technology & Engineering Languages : en Pages : 385
Book Description
Compact Models for Integrated Circuit Design: Conventional Transistors and Beyond provides a modern treatise on compact models for circuit computer-aided design (CAD). Written by an author with more than 25 years of industry experience in semiconductor processes, devices, and circuit CAD, and more than 10 years of academic experience in teaching compact modeling courses, this first-of-its-kind book on compact SPICE models for very-large-scale-integrated (VLSI) chip design offers a balanced presentation of compact modeling crucial for addressing current modeling challenges and understanding new models for emerging devices. Starting from basic semiconductor physics and covering state-of-the-art device regimes from conventional micron to nanometer, this text: Presents industry standard models for bipolar-junction transistors (BJTs), metal-oxide-semiconductor (MOS) field-effect-transistors (FETs), FinFETs, and tunnel field-effect transistors (TFETs), along with statistical MOS models Discusses the major issue of process variability, which severely impacts device and circuit performance in advanced technologies and requires statistical compact models Promotes further research of the evolution and development of compact models for VLSI circuit design and analysis Supplies fundamental and practical knowledge necessary for efficient integrated circuit (IC) design using nanoscale devices Includes exercise problems at the end of each chapter and extensive references at the end of the book Compact Models for Integrated Circuit Design: Conventional Transistors and Beyond is intended for senior undergraduate and graduate courses in electrical and electronics engineering as well as for researchers and practitioners working in the area of electron devices. However, even those unfamiliar with semiconductor physics gain a solid grasp of compact modeling concepts from this book.
Author: Peter Aaen Publisher: Cambridge University Press ISBN: 113946812X Category : Technology & Engineering Languages : en Pages : 375
Book Description
This book is a comprehensive exposition of FET modeling, and is a must-have resource for seasoned professionals and new graduates in the RF and microwave power amplifier design and modeling community. In it, you will find descriptions of characterization and measurement techniques, analysis methods, and the simulator implementation, model verification and validation procedures that are needed to produce a transistor model that can be used with confidence by the circuit designer. Written by semiconductor industry professionals with many years' device modeling experience in LDMOS and III-V technologies, this was the first book to address the modeling requirements specific to high-power RF transistors. A technology-independent approach is described, addressing thermal effects, scaling issues, nonlinear modeling, and in-package matching networks. These are illustrated using the current market-leading high-power RF technology, LDMOS, as well as with III-V power devices.
Author: Tatsuya Ezaki Publisher: World Scientific ISBN: 9814477575 Category : Technology & Engineering Languages : en Pages : 381
Book Description
This volume provides a timely description of the latest compact MOS transistor models for circuit simulation. The first generation BSIM3 and BSIM4 models that have dominated circuit simulation in the last decade are no longer capable of characterizing all the important features of modern sub-100nm MOS transistors. This book discusses the second generation MOS transistor models that are now in urgent demand and being brought into the initial phase of manufacturing applications. It considers how the models are to include the complete drift-diffusion theory using the surface potential variable in the MOS transistor channel in order to give one characterization equation.
Author: Neha Agarwal
Author: Neha Agarwal
Author: Abhishek Verra Kammula
Author: Huaxin Lu
Author: Gennady Gildenblat
Author: Wei Wang
Author: Carlos Galup-Montoro
Author: Amara Amara
Author: Samar K. Saha
Author: Peter Aaen
Author: Tatsuya Ezaki