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Author: Tuncay Ozel Publisher: Springer ISBN: 3319454145 Category : Science Languages : en Pages : 116
Book Description
This thesis focuses on the electrochemical synthesis of multi-segmented nanowires. In contrast to previous work, which was largely limited to one-dimensional modifications, Tuncay Ozel presents a technique, termed coaxial Lithography (COAL), which allows for the synthesis of coaxial nanowires in a parallel fashion with sub-10 nanometer resolution in both the axial and radial dimensions. This work has significantly expanded current synthetic capabilities with respect to materials generality and the ability to tailor two-dimensional growth in the formation of core-shell structures. These developments have enabled fundamental and applied studies which were not previously possible. The COAL technique will increase the capabilities of many researchers who are interested in studying light-matter interactions, nanoparticle assembly, solution-dispersible nanoparticles and labels, semiconductor device physics and nanowire biomimetic probe preparation. The methodology and results presented in this thesis appeal to researchers in nanomaterial synthesis, plasmonics, biology, photovoltaics, and photocatalysis.
Author: Tuncay Ozel Publisher: Springer ISBN: 3319454145 Category : Science Languages : en Pages : 116
Book Description
This thesis focuses on the electrochemical synthesis of multi-segmented nanowires. In contrast to previous work, which was largely limited to one-dimensional modifications, Tuncay Ozel presents a technique, termed coaxial Lithography (COAL), which allows for the synthesis of coaxial nanowires in a parallel fashion with sub-10 nanometer resolution in both the axial and radial dimensions. This work has significantly expanded current synthetic capabilities with respect to materials generality and the ability to tailor two-dimensional growth in the formation of core-shell structures. These developments have enabled fundamental and applied studies which were not previously possible. The COAL technique will increase the capabilities of many researchers who are interested in studying light-matter interactions, nanoparticle assembly, solution-dispersible nanoparticles and labels, semiconductor device physics and nanowire biomimetic probe preparation. The methodology and results presented in this thesis appeal to researchers in nanomaterial synthesis, plasmonics, biology, photovoltaics, and photocatalysis.
Author: Stefan Landis Publisher: John Wiley & Sons ISBN: 1118621182 Category : Technology & Engineering Languages : en Pages : 311
Book Description
Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.
Author: Chris Mack Publisher: John Wiley & Sons ISBN: 1119965071 Category : Technology & Engineering Languages : en Pages : 503
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Harry J. Levinson Publisher: SPIE Press ISBN: 9780819456601 Category : Technology & Engineering Languages : en Pages : 446
Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author: Stoyko Fakirov Publisher: Springer ISBN: 331939715X Category : Technology & Engineering Languages : en Pages : 399
Book Description
This book details all current techniques for converting bulk polymers into nano-size materials. The authors highlight various physical and chemical approaches for preparation of nano-size polymers. They describe the properties of these materials and their extensive potential commercial applications.
Author: Subhendu Chakroborty Publisher: John Wiley & Sons ISBN: 1394166494 Category : Technology & Engineering Languages : en Pages : 516
Book Description
2D NANOMATERIALS The book provides a comprehensive overview of the synthesis, modification, characterization, and application of 2D nanomaterials. In recent years, 2D nanomaterials have emerged as a remarkable cornerstone in the field of advanced materials research, with their unique properties and versatile applications captivating the attention of scientists and engineers worldwide. This book is a testament to the ever-growing interest and importance of 2D nanomaterials in the realm of materials science, nanotechnology, pharmaceuticals, and a myriad of engineering specializations. The book is structured into three sections, each delving into different aspects of 2D nanomaterials. The first section explores the synthesis of these materials, providing an overview of both top-down and bottom-up strategies. Understanding the methods by which these materials can be synthesized is crucial for advancing their potential applications. Additionally, this section details the structural characterization of 2D nanomaterials, shedding light on their intricate compositions and properties. The second section examines the diverse characteristics exhibited by 2D nanomaterials. From their magnetic and mechanical properties to their electrical, plasmonic, and optical behaviors, these materials possess an array of intriguing attributes that make them highly attractive for a wide range of applications. This section of the book provides a comprehensive understanding of these properties, enabling readers to appreciate the unique potential of 2D nanomaterials. The final section focuses on the applications of 2D nanomaterials, highlighting their use in various fields such as energy, water purification, biomedical applications, multimodal tumor therapy, and supercapacitor technology.
Author: Publisher: Elsevier ISBN: 0081003587 Category : Science Languages : en Pages : 636
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author: Publisher: ScholarlyEditions ISBN: 1464966303 Category : Science Languages : en Pages : 736
Book Description
Issues in Nuclear and Plasma Science and Technology: 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Nuclear and Plasma Science and Technology. The editors have built Issues in Nuclear and Plasma Science and Technology: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Nuclear and Plasma Science and Technology in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Issues in Nuclear and Plasma Science and Technology: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Author: Bruce W. Smith Publisher: CRC Press ISBN: 1439876762 Category : Technology & Engineering Languages : en Pages : 838
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author: Hamed Barabadi Publisher: Springer Nature ISBN: 3031126580 Category : Science Languages : en Pages : 641
Book Description
The field of nanotechnology for targeted therapy initiated more than decade ago has grown fast and interest is increasing. Given the importance of the field for targeted drug and gene delivery systems, there are a large number of laboratory investigations today researching nanobiomaterials for diagnostic and therapeutic applications. Because of the ability of scientists to load nanoparticles with any agent, interest continues to grow and technology in this arena is rapidly evolving. These emerging nanobiomaterials-based medicines can overcome the disadvantages of traditional medicines by target-oriented and site-specific delivery of precise medicines (immunotherapeutic agents, chemotherapeutic agents, diagnostic agents, and so on). Pharmaceutical Nanobiotechnology for Targeted Therapy presents an updated overview of recent advancements in the field of pharmaceutical nanobiotechnology and nano-based drug and gene delivery systems. This comprehensive knowledge will allow researchers to discover innovative nanobiomaterials for targeted therapeutics. The chapters deal with various emerging nanobiomaterials for targeted therapeutic delivery systems and the writing is in a style that is easily disseminated and in a manner that can be readily adopted as sources for new and further studies. This book should be useful for researchers and professionals from academia and industry working in the field of nanotechnology, nanobiotechnology, as well as in the field of pharmaceutical nanotechnology. It should also be useful to those interested in a range of disciplines from material science, chemistry, molecular biology, polymer chemistry, and many more interdisciplinary areas.
Author: Tuncay Ozel
Author: Tuncay Ozel
Author: Stefan Landis
Author: Chris Mack
Author: Harry J. Levinson
Author: Stoyko Fakirov
Author: Subhendu Chakroborty
Author: 
Author: 
Author: Bruce W. Smith
Author: Hamed Barabadi