Author: Charalampos S. DrososPublisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Chemical Vapour Deposition of Thin Film Metal Oxides on Glass
Author: Charalampos S. DrososChemical Vapour Deposition of Thin Film Metal Oxides on Glass
Author: C. DrososCharacteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass, with Or Without Metal Dopants
Author: Gillian WaltersCoatings on Glass
Author: H. PulkerPublisher: Elsevier
ISBN: 0080525555
Category : Science
Languages : en
Pages : 569
Book Description
This is the second, revised edition of a book that has already proved invaluable to a wide range of readers. Written by a scientist for scientists and technical people, it goes beyond the subject matter indicated by the title, filling the gap which previously existed in the available technical literature. It includes a wealth of information for physicists, chemists and engineers who need to know more about thin films for research purposes, or who want to use this special form of solid material to achieve a variety of application-oriented goals.
Chemical Vapour Deposition
Author: Anthony C. JonesPublisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Vacuum Deposition of Thin Films
Author: L. HollandPublisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 608
Book Description
Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass, with Or Without Metal Dopants
Author: Thin Film Metal-Oxides
Author: Shriram RamanathanPublisher: Springer Science & Business Media
ISBN: 1441906649
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
Chemical Solution Deposition of Functional Oxide Thin Films
Author: Theodor SchnellerPublisher: Springer Science & Business Media
ISBN: 3211993118
Category : Technology & Engineering
Languages : en
Pages : 801
Book Description
This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
On the Synthesis and Chemical Vapour Deposition of Group 13 Precursors Towards Metal Oxide Thin Films
Author: L. G. BloorPublisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Various routes towards novel chlorogallium bis(alkoxides) and heteroleptic gallium alkoxides have been investigated. Compounds of the type, [GaCl(OR2)2] and [Ga(OR2)2(OR')] (R = CH2CH2NMe2, CH2CH2NEt2, CH2CH2CH2NMe2; R' = Me, Et, iPr, tBu), were synthesised using air sensitive methods and analysed by a variety of techniques. The chlorogallium bis(alkoxides) showed diastereotopic NMR splitting and in depth 1H NMR studies and DFT calculations were carried out on [GaCl(OCH2CH2CH2NMe2)2] to investigate the in situ ring conversion mechanism. Thermogravimetric analysis was employed to study the decomposition characteristics of the compounds, which were then used as single-source precursors towards gallium oxide thin films using aerosol-assisted chemical vapour deposition (AACVD). Amorphous, transparent films of Ga2O3 were deposited at 450 °C onto glass and quartz substrates. Subsequent annealing at 1000 °C gave crystalline films. Nitrogen-doped indium oxide films were deposited by AACVD via the in situ reaction of [In{NtBu(SiMe3)}3] and three equivalents of HOCH2CH2NMe2. The resultant films had a range of morphologies depending on solvent and temperature employed during the deposition. The cubic phase In2O3 films deposited had band gaps of ~2.9 eV suggesting nitrogen incorporation. These films were tested on steel and titanium substrates for their visible light water-splitting properties. Films were tested for their hydrogen production but limited activity as a photocatalyst was observed in the visible region. However, In2O3 nanoparticles produced using a solvothermal method and Ti- and Ta-doped In2O3 thin films grown via AACVD were tested for their gas sensing properties. Sensors were tested against reducing oxidising gases. The In2O3 nanoparticles showed the highest response to all gases, in particular ethanol. In2O3:Ta also showed a significant response to ethanol and smaller responses to other gases. Overall, novel precursors have been used as single-source precursors to main group oxide thin films, which were deposited via AACVD. Photocatalytic and gas sensing applications of these films have been explored.