Author: Thomas Raymond Ohnstein
Publisher:
ISBN:
Category : Gallium arsenide
Languages : en
Pages : 156
Book Description
Chemical Vapor Deposition of Silicon Nitride Films on Gallium Arsenide
An Investigation of Silicon Nitride on Gallium Arsenide
Author: Thomas Raymond Ohnstein
Publisher:
ISBN:
Category :
Languages : en
Pages : 382
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 382
Book Description
THE LOW-TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION AND CATALYZED CHEMICAL VAPOR DEPOSITION OF ALUMINUM NITRIDE AND SILICON NITRIDE (CHEMICAL VAPOR DEPOSITION).
Author: JEFFREY L. DUPUIE
Publisher:
ISBN:
Category :
Languages : en
Pages : 396
Book Description
deposition scheme holds much promise for low temperature film growth.
Publisher:
ISBN:
Category :
Languages : en
Pages : 396
Book Description
deposition scheme holds much promise for low temperature film growth.
Laser-induced Chemical Vapor Deposition of Silicon Nitride Films
Silicon Nitride and Silicon Dioxide Thin Insulating Films
The metal organic-chemical vapor deposition of gallium arsenide thin films on silicon and gallium arsenide substrates
Author: Christopher Thomas
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 172
Book Description
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 172
Book Description
Chemical Vapor Deposition: 1960-1980
Author: Donald T. Hawkins
Publisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Publisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Low Pressure Chemical Vapor Deposition of Silicon Nitride Films from Ditertiarybutylsilane
Author: Xiangqun Fan
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 120
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 120
Book Description
Handbook of Chemical Vapor Deposition
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Low Pressure Chemical Vapor Deposition of Silicon Nitride Films from Tridimethylaminosilane
Author: Xin Lin
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 242
Book Description
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 242
Book Description