Author: Robert M. GalassoPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 60
Book Description
Chemical Vapor Deposition of Silicon Carbide on Graphite and Titanium Using a Combined Hot Wall and Heated Substrate Reactor
Author: Robert M. GalassoPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 60
Book Description
Chemical Vapor Deposition of Silicon Carbide in a Hot Wall Reactor
Author: Feng GaoChemical Vapor Deposition: 1960-1980
Author: Donald T. HawkinsPublisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Vacuum Technology
Author: Roger FabianPublisher: ASM International
ISBN: 9781615031511
Category : Technology & Engineering
Languages : en
Pages : 278
Book Description
Principles of Chemical Vapor Deposition
Author: D.M. DobkinPublisher: Springer Science & Business Media
ISBN: 9401703698
Category : Technology & Engineering
Languages : en
Pages : 277
Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Ceramic Abstracts
Author: Chemical Vapor Deposition of Refractory Metals and Ceramics: Volume 168
Author: Theodore M. BesmannPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 432
Book Description
Papers originally presented at the symposium on [title] held in Boston, November/December 1989. The contributions are organized into six sections, covering fundamentals/modeling, diagnostics, process- microstructure relationships, microstructure-mechanical property relationships, novel/large-scale technologies, and metal-organic chemical vapor deposition. Acidic paper. Annotation copyrighted by Book News, Inc., Portland, OR
Chemical Abstracts
Author: Electrical & Electronics Abstracts
Author: Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 1948
Book Description
Author: