Author: Kenneth Ka Shun LauPublisher:
ISBN:
Category :
Languages : en
Pages : 460
Book Description
Chemical Vapor Deposition of Fluorocarbon Films for Low Dielectric Constant Thin Film Applications
Author: Kenneth Ka Shun LauChemical Vapor Deposition of Fluorocarbon Films for Low Dielectric Constant Interlayer Dielectric Applications
Author: Brett Alexander CrudenPublisher:
ISBN:
Category :
Languages : en
Pages : 315
Book Description
Low Dielectric Constant SiCOH Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition and Their Etching Characteristics Using Fluorocarbon-based Plasma
Author: Jacob ComeauxPublisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 0
Book Description
Chemical Vapor Deposition Polymerization
Author: Jeffrey B. FortinPublisher: Springer Science & Business Media
ISBN: 147573901X
Category : Science
Languages : en
Pages : 112
Book Description
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Low Dielectric Constant Materials for IC Applications
Author: Paul S. HoPublisher: Springer Science & Business Media
ISBN: 9783540678199
Category : Medical
Languages : en
Pages : 340
Book Description
Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for
Low Dielectric Constant Fluorocarbon Films Containing Silicon by Plasma Enhanced Chemical Vapor Deposition
Author: Yoonyoung JinHandbook of Thin Film Deposition
Author: Krishna SeshanPublisher: William Andrew
ISBN: 1437778747
Category : Technology & Engineering
Languages : en
Pages : 411
Book Description
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry
Low Dielectric Constant Fluorinated Diamond-like Carbon Thin Films by Plasma Enhanced Chemical Vapor Deposition
Author: Jeong Woo YiChemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
Author: Y. PauleauPublisher: Springer Science & Business Media
ISBN: 940100353X
Category : Technology & Engineering
Languages : en
Pages : 372
Book Description
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials DivisionPublisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description