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Chemical Vapor Deposition of Diamond Thin Films on Titanium Silicon Carbide

Author: Songlan Yang
Publisher:
ISBN: 9780494921791
Category :
Languages : en
Pages :

Book Description

Chemical Vapor Deposition of Diamond Thin Films on Titanium Silicon Carbide

Author: Songlan Yang
Publisher:
ISBN: 9780494921791
Category :
Languages : en
Pages :

Book Description

Chemical Vapor Deposition of Diamond Thin Films on Titanium Silicon Carbide

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description
Chemical vapor deposition (CVD) has been the main method for synthesizing diamond thin films on hetero substrate materials since 1980s. It has been well acknowledged that both nucleation and growth of diamond on non-diamond surfaces without pre-treatment are very difficult and slow. Furthermore, the weak adhesion between the diamond thin films and substrates has been a major problem for widespread application of diamond thin films. Up to now, Si has been the most frequently used substrate for the study of diamond thin films and various methods, including bias and diamond powder scratching, have been applied to enhance diamond nucleation density. In the present study, nucleation and growth of diamond thin films on Ti3SiC2, a newly developed ceramic-metallic material, using Microwave Plasma Enhanced (MPE) and Hot-Filament (HF) CVD reactors were carried out. In addition, synchrotron-based Near Edge Extended X-Ray Absorption Fine Structure Spectroscopy (NEXAFS) was used to identify the electronic and chemical structures of various NCD films. The results from MPECVD showed that a much higher diamond nucleation density and a much higher film growth rate can be obtained on Ti3SiC2 compared with on Si. Consequently, nanocrystalline diamond (NCD) thin films were feasibly synthesized on Ti3SiC2 under the typical conditions for microcrystalline diamond film synthesis. Furthermore, the diamond films on Ti3SiC2 exhibited better adhesion than on Si. The early stage growth of diamond thin films on Ti3SiC2 by HFCVD indicated that a nanowhisker-like diamond-graphite composite layer, different from diamond nucleation on Si, initially formed on the surface of Ti3SiC2, which resulted in high diamond nucleation density. These results indicate that Ti3SiC2 has great potentials to be used both as substrates and interlayers on metals for diamond thin film deposition and application. This research may greatly expand the tribological application of both Ti3SiC2 and diamond thin films. The re.

Handbook of Chemical Vapor Deposition

Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459

Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Silicon Carbide Thin Films Via Low Pressure Chemical Vapor Deposition for Micro- and Nano-electromechanical Systems

Author: Christopher Stephen Roper
Publisher:
ISBN:
Category :
Languages : en
Pages : 390

Book Description

Diamond Films

Author: Koji Kobashi
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350

Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.

Chemical Vapor Deposition of Silicon Carbide on Graphite and Titanium Using a Combined Hot Wall and Heated Substrate Reactor

Author: Robert M. Galasso
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 60

Book Description

Diamond Chemical Vapor Deposition

Author: Huimin Liu
Publisher: Elsevier
ISBN: 0815516878
Category : Technology & Engineering
Languages : en
Pages : 207

Book Description
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.