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Author: Y. Pauleau Publisher: Springer Science & Business Media ISBN: 940100353X Category : Technology & Engineering Languages : en Pages : 372
Book Description
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author: Y. Pauleau Publisher: Springer Science & Business Media ISBN: 940100353X Category : Technology & Engineering Languages : en Pages : 372
Book Description
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author: Krishna Seshan Publisher: William Andrew ISBN: 0128123125 Category : Technology & Engineering Languages : en Pages : 472
Book Description
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics
Author: Krishna Seshan Publisher: William Andrew ISBN: 0815517785 Category : Technology & Engineering Languages : en Pages : 430
Book Description
New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author: Babasaheb R. Sankapal Publisher: Springer Nature ISBN: 9819909619 Category : Science Languages : en Pages : 590
Book Description
This book explores chemical methods for thin film deposition with diverse nanostructured morphology and their applications. Unlike top-down techniques, chemical methods offer low cost, simplicity, and growth of nanostructured surface architecture with ease of small to large-scale area deposition. The book primarily focuses on innovative twelve chemical methods for thin-film deposition on one platform. Since each method has its own advantages and disadvantages, it is crucial to select the specific method for specific material to be deposited depending upon what type of application is targeted. Due to inclusive of diverse chemical deposition methods, researcher will have knowledge about best choice of the deposition method to be adopted. Inclusive methods discussed in the book are chemical bath deposition, successive ionic layer adsorption and reaction, ion exchange, electroless deposition, electrodeposition, hydrothermal, spray pyrolysis, spin coating, dip coating, doctor blade, screen printing, and sol-gel. The selection of the correct procedure for material to be deposited in thin film form depends on its unique process parameters based on the kind of application and its requirement. The role of preparative factors necessary for thin film alters properties related to structure and surface morphology, electrical conductivity and optical band gap which have been extensively discussed along with the underlying science of film synthesis. The book provides a comprehensive overview of the field of chemical methods for thin film synthesis to applications. In addition to synthesis, the book covers characterization, instrumentation, and industrial application of thin films. As a result, concentrated techniques will be of great interest to university/college professors, students and new engineers as well as postdocs and scientists in the area.
Author: Kiyotaka Wasa Publisher: William Andrew ISBN: 0815519311 Category : Technology & Engineering Languages : en Pages : 533
Book Description
An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.
Author: Sushil Kumar Publisher: Springer Nature ISBN: 9811561168 Category : Technology & Engineering Languages : en Pages : 721
Book Description
This volume comprises the expert contributions from the invited speakers at the 17th International Conference on Thin Films (ICTF 2017), held at CSIR-NPL, New Delhi, India. Thin film research has become increasingly important over the last few decades owing to the applications in latest technologies and devices. The book focuses on current advances in thin film deposition processes and characterization including thin film measurements. The chapters cover different types of thin films like metal, dielectric, organic and inorganic, and their diverse applications across transistors, resistors, capacitors, memory elements for computers, optical filters and mirrors, sensors, solar cells, LED's, transparent conducting coatings for liquid crystal display, printed circuit board, and automobile headlamp covers. This book can be a useful reference for students, researchers as well as industry professionals by providing an up-to-date knowledge on thin films and coatings.
Author: Jagannathan Thirumalai Publisher: BoD – Books on Demand ISBN: 9535130676 Category : Science Languages : en Pages : 222
Book Description
The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.
Author: Werner Kern Publisher: Elsevier ISBN: 0080524214 Category : Technology & Engineering Languages : en Pages : 881
Book Description
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Provides an all-new sequel to the 1978 classic, Thin Film Processes Introduces new topics, and several key topics presented in the original volume are updated Emphasizes practical applications of major thin film deposition and etching processes Helps readers find the appropriate technology for a particular application
Author: Krishna Seshan Publisher: ISBN: 9786612253195 Category : Chemical vapor deposition Languages : en Pages : 629
Book Description
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author: Alireza Zaker Moshfegh Publisher: World Scientific ISBN: 9812702873 Category : Science Languages : en Pages : 549
Book Description
Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications. Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies. This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy. Contents: Deposition Processes; Characterization Techniques; Surface Processes; Nanomaterials; Optical Materials; Superconductivity; Magnetic Thin Films. Readership: Graduate students and researchers involved with the physics and technology of thin films.