Author: Publisher:
ISBN:
Category : Ceramics
Languages : en
Pages : 972
Book Description
Ceramic Abstracts
Author: Chemical Abstracts
Author: Physics Briefs
Author: Fiber Optic Sensors
Author: Ignacio R. MatiasPublisher: Springer
ISBN: 3319426257
Category : Technology & Engineering
Languages : en
Pages : 379
Book Description
This book describes important recent developments in fiber optic sensor technology and examines established and emerging applications in a broad range of fields and markets, including power engineering, chemical engineering, bioengineering, biomedical engineering, and environmental monitoring. Particular attention is devoted to niche applications where fiber optic sensors are or soon will be able to compete with conventional approaches. Beyond novel methods for the sensing of traditional parameters such as strain, temperature, and pressure, a variety of new ideas and concepts are proposed and explored. The significance of the advent of extended infrared sensors is discussed, and individual chapters focus on sensing at THz frequencies and optical sensing based on photonic crystal structures. Another important topic is the resonances generated when using thin films in conjunction with optical fibers, and the enormous potential of sensors based on lossy mode resonances, surface plasmon resonances, and long-range surface exciton polaritons. Detailed attention is also paid to fiber Bragg grating sensors and multimode interference sensors. Each chapter is written by an acknowledged expert in the subject under discussion.
Indian Journal of Engineering and Materials Sciences
Author: Ionized Physical Vapor Deposition
Author: Publisher: Academic Press
ISBN: 008054293X
Category : Science
Languages : en
Pages : 268
Book Description
This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
High Power Impulse Magnetron Sputtering
Author: Daniel LundinPublisher: Elsevier
ISBN: 0128124547
Category : Technology & Engineering
Languages : en
Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Handbook of Deposition Technologies for Films and Coatings
Author: Peter M. MartinPublisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Cathodic Arcs
Author: André AndersPublisher: Springer Science & Business Media
ISBN: 0387791086
Category : Science
Languages : en
Pages : 555
Book Description
Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
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