Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography PDF Download
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Author: Publisher: ISBN: Category : Languages : en Pages :
Book Description
The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.
Author: Publisher: ISBN: Category : Languages : en Pages :
Book Description
The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.
Author: Joseph Braat Publisher: Cambridge University Press ISBN: 1108428088 Category : Medical Languages : en Pages : 987
Book Description
This comprehensive and self-contained text for researchers and professionals presents a detailed account of optical imaging from the viewpoint of both ray and wave optics.
Author: Optical Society of America Publisher: McGraw Hill Professional ISBN: 0071753427 Category : Technology & Engineering Languages : en Pages : 6122
Book Description
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments. Volume II covers design, fabrications, testing, sources, detectors, radiometry, and photometry. Volume III, all in full color, covers vision and vision optics. Volume IV covers optical properties of materials, nonlinear optics, and quantum optics. Volume V covers atmospheric optics, modulators, fiber optics, and x-ray and neutron optics. Visit www.HandbookofOpticsOnline.com to search all five volumes and download a comprehensive index.
Author: Michael Bass Publisher: McGraw Hill Professional ISBN: 0071633146 Category : Technology & Engineering Languages : en Pages : 1293
Book Description
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume V covers atmospheric optics, modulators, fiber optics, and x-ray and neutron optics.
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Author: Kenneth Alan Goldberg
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Author: Bernice M. Lum
Author: Joseph Braat
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Author: Optical Society of America
Author: Michael Bass