Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2018
Book Description
Chemical Abstracts
TMS 2012 141st Annual Meeting and Exhibition, Materials Properties, Characterization, and Modeling
Author: The Minerals, Metals & Materials Society (TMS)
Publisher: John Wiley & Sons
ISBN: 1118356977
Category : Technology & Engineering
Languages : en
Pages : 909
Book Description
This book contains chapters on cutting-edge developments presented at the TMS annual conference of 2012.
Publisher: John Wiley & Sons
ISBN: 1118356977
Category : Technology & Engineering
Languages : en
Pages : 909
Book Description
This book contains chapters on cutting-edge developments presented at the TMS annual conference of 2012.
Scientific and Technical Aerospace Reports
Handbook of Zinc Oxide and Related Materials
Author: Zhe Chuan Feng
Publisher: Taylor & Francis
ISBN: 143985582X
Category : Science
Languages : en
Pages : 992
Book Description
Through their application in energy-efficient and environmentally friendly devices, zinc oxide (ZnO) and related classes of wide gap semiconductors, including GaN and SiC, are revolutionizing numerous areas, from lighting, energy conversion, photovoltaics, and communications to biotechnology, imaging, and medicine. With an emphasis on engineering a
Publisher: Taylor & Francis
ISBN: 143985582X
Category : Science
Languages : en
Pages : 992
Book Description
Through their application in energy-efficient and environmentally friendly devices, zinc oxide (ZnO) and related classes of wide gap semiconductors, including GaN and SiC, are revolutionizing numerous areas, from lighting, energy conversion, photovoltaics, and communications to biotechnology, imaging, and medicine. With an emphasis on engineering a
The Journal of the Korean Physical Society
Electrical & Electronics Abstracts
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 1948
Book Description
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 1948
Book Description
JJAP
Japanese Journal of Applied Physics
Advanced Strategies in Thin Film Engineering by Magnetron Sputtering
Author: Alberto Palmero
Publisher: MDPI
ISBN: 3039364294
Category : Science
Languages : en
Pages : 148
Book Description
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Publisher: MDPI
ISBN: 3039364294
Category : Science
Languages : en
Pages : 148
Book Description
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.