Author: Publisher:
ISBN:
Category : Crystals
Languages : en
Pages : 216
Book Description
Calculation of the Properties of Vacancies and Interstitials
Author: Journal of Research of the National Bureau of Standards
Author: Calculation of the Properties of Vacancies and Interstitials
Author: Journal of Research of the National Bureau of Standards
Author: United States. National Bureau of StandardsPublisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 826
Book Description
Journal of Research
Author: United States. National Bureau of StandardsPublisher:
ISBN:
Category : Engineering
Languages : en
Pages : 590
Book Description
Point Defects in Semiconductors and Insulators
Author: Johann-Martin SpaethPublisher: Springer Science & Business Media
ISBN: 9783540426950
Category : Technology & Engineering
Languages : en
Pages : 508
Book Description
The precedent book with the title "Structural Analysis of Point Defects in Solids: An introduction to multiple magnetic resonance spectroscopy" ap peared about 10 years ago. Since then a very active development has oc curred both with respect to the experimental methods and the theoretical interpretation of the experimental results. It would therefore not have been sufficient to simply publish a second edition of the precedent book with cor rections and a few additions. Furthermore the application of the multiple magnetic resonance methods has more and more shifted towards materials science and represents one of the important methods of materials analysis. Multiple magnetic resonances are used less now for "fundamental" studies in solid state physics. Therefore a more "pedestrian" access to the meth ods is called for to help the materials scientist to use them or to appreciate results obtained by using these methods. We have kept the two introduc tory chapters on conventional electron paramagnetic resonance (EPR) of the precedent book which are the base for the multiple resonance methods. The chapter on optical detection of EPR (ODEPR) was supplemented by sections on the structural information one can get from "forbidden" transitions as well as on spatial correlations between defects in the so-called "cross relaxation spectroscopy". High-field ODEPR/ENDOR was also added. The chapter on stationary electron nuclear double resonance (ENDOR) was supplemented by the method of stochastic END OR developed a few years ago in Paderborn which is now also commercially available.
Structure-Property Relationships in Surface-Modified Ceramics
Author: C.J. McHarguePublisher: Springer Science & Business Media
ISBN: 9400909837
Category : Technology & Engineering
Languages : en
Pages : 517
Book Description
The use of ion beams for the modification of the structure and properties of the near-surface region of ceramics began in earnest in the early 19805. Since the mechanical properties of such materials are dominated by surface flaws and the surface stress state, the use of surface modification tech niques would appear to be an obvious application. As is often the case in research and development, most of the initial studies can be characterized as cataloging the response of various ceramic materials to a range of ion beam treatments. The systematic study of material and ion beam parameters is well underway and we are now designing experiments to provide specific information about the processing parameter - structure-property rela tionships. This NATO-Advanced Study Institute was convened in order to assess our current state of knowledge in this field, to identify opportunities and needs for further research, and to identify the potential of such processes for technological application. It became apparent that this class of inorganic compounds, loosely termed ceramics, presents many challenges to the understanding of ion-solid inter actions, the relationships among ion-beam parameters, materials parameters, and the resulting structures, as well as relationships between structure and properties. In many instances, this understanding will represent a major extension of that learned from the study of metals and semiconductors.
Energy Research Abstracts
Author: Springer Handbook of Electronic and Photonic Materials
Author: Safa KasapPublisher: Springer
ISBN: 331948933X
Category : Technology & Engineering
Languages : en
Pages : 1536
Book Description
The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.
Simulation of Semiconductor Processes and Devices 2007
Author: Tibor GrasserPublisher: Springer Science & Business Media
ISBN: 3211728619
Category : Technology & Engineering
Languages : en
Pages : 472
Book Description
This volume contains the proceedings of the 12th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2007, held September 2007 in Vienna, Austria. It provides a global forum for the presentation and discussion of recent advances and developments in the theoretical description, physical modeling and numerical simulation and analysis of semiconductor fabrication processes, device operation and system performance.