Author: Dennis Michael HausmannPublisher:
ISBN:
Category : Thin film devices
Languages : en
Pages : 350
Book Description
Atomic Layer Deposition of Metal Oxide Thin Films
Author: Dennis Michael HausmannPublisher:
ISBN:
Category : Thin film devices
Languages : en
Pages : 350
Book Description
Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform]
![Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] PDF](https://books.google.com/books/content/images/frontcover/8hsXnQEACAAJ?fife=w80-h100)
Author: Becker, Jill SvenjaPublisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category : Thin film devices
Languages : en
Pages : 308
Book Description
Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates
Author: Ali Foroughi AbariPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Atomic Layer Deposition and Characterization of Metal Oxide Thin Films
Author: Ali MahmoodinezhadThin Film Metal-Oxides
Author: Shriram RamanathanPublisher: Springer Science & Business Media
ISBN: 1441906649
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
Atomic Layer Deposition for Semiconductors
Author: Cheol Seong HwangPublisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Mechanistic Insight and Properties of Metal Oxide Thin Films Deposited Via Atomic Layer Deposition
Author: Benjamin PeekAtomic Layer Deposition of Metal Oxide Thin Films for Si Heterojunction Solar Cells
Author: B. MaccoPublisher:
ISBN: 9789038641454
Category :
Languages : en
Pages : 225
Book Description
Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films
Author: Jeffrey Thomas BartonPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 276
Book Description
Chemical Vapour Deposition
Author: Anthony C. JonesPublisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket