Atomic Layer Deposition for Energy Conversion and Storage Applications PDF Download

Author: Sebastian Häringer
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Author: Julien Bachmann
Publisher: John Wiley & Sons
ISBN: 3527339124
Category : Technology & Engineering
Languages : en
Pages : 308

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Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.

Author: Alexander Hufnagel
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Book Description

Author: Julien Bachmann
Publisher: John Wiley & Sons
ISBN: 3527694811
Category : Technology & Engineering
Languages : en
Pages : 312

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Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.

Author: David Cameron
Publisher: MDPI
ISBN: 3039366521
Category : Science
Languages : en
Pages : 142

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Book Description
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.

Author: Zhaodong Li
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Book Description
Atomic layer deposition (ALD) is a cyclic, multi-step thin film chemical vapor deposition process based on sequential self-limiting surface reactions. It has been widely applied for synthesizing various three dimensional (3D) nanoscale morphologies. Recently, based on ALD process, a surface-reaction-limited pulsed chemical vapor deposition (SPCVD) technique was developed for 3D hierarchical branched nanowire (NW) architecture with super high surface area density and good electronic transport properties. This new ALD-based nanomanufacturing technique demonstrated great potential to conduct large-area and low-cost fabrication of high-density 3D nanomaterials for energy harvesting and storage applications, such as photoelectrochemical (PEC) water splitting, solar cells, batteries and supercapacitors. In this dissertation, a series of experimental work is presented regarding fundamental understandings and rational controls of the SPCVD process in branched nanorod (NR) synthesis, as well as the application potentials of 3D branched nanowire architectures. First, the composition control ability of SPCVD was studied on nitrogen-doped TiO2 NRs to overcome the intrinsically visible light absorption constrains of metal oxide semiconductors. Second, to further improve the porosity and surface area while maintain good redox reaction kinetics, several 3D cellulose nanofibers (CNFs) templated fibrous TiO2 nanoarchitectures were synthesized. By integrating the strong capillary property of CNF film, the capillary PEC and capillary photocatalytic systems were developed by performing water redox reactions outside of the body of electrolyte with enhanced reaction kinetics and higher efficiency. At last, SPCVD was applied to the growth of high-density vanadium oxide (VOx) NR branches on Si NW backbones. Such a 3D hierarchical VOx/Si NW structure exhibited enhanced performance as a supercapacitor. These achievements open a new avenue of ALD for large-area, low-cost, and green fabrication of materials, which would be used in solar energy conversion and electrical energy storage.

Author: Nicola Pinna
Publisher: John Wiley & Sons
ISBN: 3527639926
Category : Technology & Engineering
Languages : en
Pages : 463

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Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Author: James Steven Daubert
Publisher:
ISBN:
Category :
Languages : en
Pages : 169

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Author: J. W. Elam
Publisher: The Electrochemical Society
ISBN: 1566778212
Category : Science
Languages : en
Pages : 469

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Book Description
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.

Author: Felipe A. La Porta
Publisher: Springer Nature
ISBN: 3030622266
Category : Technology & Engineering
Languages : en
Pages : 778

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Book Description
This book shows how a small toolbox of experimental techniques, physical chemistry concepts as well as quantum/classical mechanics and statistical methods can be used to understand, explain and even predict extraordinary applications of these advanced engineering materials and biomolecules. It highlights how improving the material foresight by design, including the fundamental understanding of their physical and chemical properties, can provide new technological levels in the future.