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Author: Julien Bachmann Publisher: John Wiley & Sons ISBN: 3527694838 Category : Technology & Engineering Languages : en Pages : 366
Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
Author: Julien Bachmann Publisher: John Wiley & Sons ISBN: 3527694838 Category : Technology & Engineering Languages : en Pages : 366
Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
Author: Ana Londergan Publisher: The Electrochemical Society ISBN: 1566775736 Category : Atomic layer deposition Languages : en Pages : 300
Book Description
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. Following two successful years, this symposium is well on its way to becoming a forum for the sharing of cutting edge research in the various areas where ALD is used.
Author: Ana Londergan Publisher: The Electrochemical Society ISBN: 1566775426 Category : Atomic layer deposition Languages : en Pages : 300
Book Description
This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.
Author: J. W. Elam Publisher: The Electrochemical Society ISBN: 1566778212 Category : Science Languages : en Pages : 469
Book Description
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.
Author: S. de Gendt Publisher: The Electrochemical Society ISBN: 1566777410 Category : Languages : en Pages : 425
Book Description
Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.
Author: Julien Bachmann
Author: Julien Bachmann
Author: F. Roozeboom
Author: 
Author: Ana Londergan
Author: Ana Londergan
Author: James Steven Daubert
Author: J. W. Elam
Author: F. Roozeboom
Author: J. W. Elam
Author: S. de Gendt