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Author: Taeho Woo Publisher: Springer Science & Business Media ISBN: 1447140303 Category : Technology & Engineering Languages : en Pages : 185
Book Description
Atomic Information Technology revaluates current conceptions of the information technology aspects of the nuclear industry. Economic and safety research in the nuclear energy sector are explored, considering statistical methods which incorporate Monte-Carlo simulations for practical applications. Divided into three sections, Atomic Information Technology covers: Atomic economics and management, Atomic safety and reliability, and Atomic safeguarding and security. Either as a standalone volume or as a companion to conventional nuclear safety and reliability books, Atomic Information Technology acts as a concise and thorough reference on statistical assessment technology in the nuclear industry. Students and industry professionals alike will find this a key tool in expanding and updating their understanding of this industry and the applications of information technology within it.
Author: Taeho Woo Publisher: Springer Science & Business Media ISBN: 1447140303 Category : Technology & Engineering Languages : en Pages : 185
Book Description
Atomic Information Technology revaluates current conceptions of the information technology aspects of the nuclear industry. Economic and safety research in the nuclear energy sector are explored, considering statistical methods which incorporate Monte-Carlo simulations for practical applications. Divided into three sections, Atomic Information Technology covers: Atomic economics and management, Atomic safety and reliability, and Atomic safeguarding and security. Either as a standalone volume or as a companion to conventional nuclear safety and reliability books, Atomic Information Technology acts as a concise and thorough reference on statistical assessment technology in the nuclear industry. Students and industry professionals alike will find this a key tool in expanding and updating their understanding of this industry and the applications of information technology within it.
Author: United States. Office of State Technical Services Publisher: ISBN: Category : Information storage and retrieval systems Languages : en Pages : 66
Author: National Science and Technology Council (U.S.). Interagency Working Group on Information Technology Research and Development Publisher: ISBN: Category : Computer networks Languages : en Pages : 64
Author: Ehrenfried Zschech Publisher: Springer Science & Business Media ISBN: 1846282357 Category : Technology & Engineering Languages : en Pages : 498
Book Description
This book provides an up to date survey of the state of the art of research into the materials used in information technology, and will be bought by researchers in universities, institutions as well as research workers in the semiconductor and IT industries.
Author: I. T. L. Education Solutions Limited Publisher: Pearson Education India ISBN: 9788177581188 Category : Business & Economics Languages : en Pages : 672
Author: Information Resources Management Association. International Conference Publisher: IGI Global ISBN: 9781930708075 Category : Computers Languages : en Pages : 1226
Book Description
Today, opportunities and challenges of available technology can be utilized as strategic and tactical resources for your organization. Conversely, failure to be current on the latest trends and issues of IT can lead to ineffective and inefficient management of IT resources. Managing Information Technology in a Global Economy is a valuable collection of papers that presents IT management perspectives from professionals around the world. The papers introduce new ideas, refine old ones and possess interesting scenarios to help the reader develop company-sensitive management strategies.
Author: Weiming Shen Publisher: Springer Science & Business Media ISBN: 0387365907 Category : Technology & Engineering Languages : en Pages : 509
Book Description
BASYS conferences were initially organized to promote the development of balanced automation systems. The first BASYS conference was successfully launched in Victoria, Brazil, in 1995. BASYS'06 is the 7th edition in this series. This book comprises three invited keynote papers and forty-nine regular papers accepted for presentation at the conference. All together, these papers will make significant contributions to the literature of Intelligent Technology for Balanced Manufacturing Systems.
Author: Thorsten Lill Publisher: John Wiley & Sons ISBN: 3527346686 Category : Technology & Engineering Languages : en Pages : 306
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Author: Imre J. Rudas Publisher: Springer Science & Business Media ISBN: 3642037364 Category : Computers Languages : en Pages : 719
Book Description
This book presents the state of the art of computational intelligence ion engineering. It offers challenging problems for efficient modeling of intelligent systems and details different methodologies of computational intelligence with real life applications.
Author: Taeho Woo
Author: Taeho Woo
Author: United States. Office of State Technical Services
Author: National Science and Technology Council (U.S.). Interagency Working Group on Information Technology Research and Development
Author: Ehrenfried Zschech
Author: I. T. L. Education Solutions Limited
Author: Information Resources Management Association. International Conference
Author: Weiming Shen
Author: Thorsten Lill
Author: R.c.mishra
Author: Imre J. Rudas