Atom and Ion Sources PDF Download

Author: László Vályi
Publisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 440

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Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 9780849325021
Category : Technology & Engineering
Languages : en
Pages : 558

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Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Author: Ian G. Brown
Publisher: John Wiley & Sons
ISBN: 3527604545
Category : Science
Languages : en
Pages : 396

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Book Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

Author: Dzevad Belkic
Publisher: World Scientific
ISBN: 9814407135
Category : Science
Languages : en
Pages : 335

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Book Description
The principal goal of this book is to provide state-of-the-art coverage of the non-relativistic three- and four-body theories at intermediate and high energy ion-atom and ion-molecule collisions. The focus is on the most frequently studied processes: electron capture, ionization, transfer excitation and transfer ionization. The content is suitable both for graduate students and experienced researchers. For these collisions, the literature has seen enormous renewal of activity in the development and applications of quantum-mechanical theories. This subject is of relevance in several branches of science and technology, like accelerator-based physics, the search for new sources of energy and high temperature fusion of light ions. Other important applications are in life sciences via medicine, where high-energy ion beams are used in radiotherapy for which a number of storage ring accelerators are in full operation, under construction or planned to be built worldwide. Therefore, it is necessary to review this field for its most recent advances with an emphasis on the prospects for multidisciplinary applications.This book is accompanied by Interdisciplinary Research on Particle Collisions and Quantitative Spectroscopy Volume 2 - Fast Collisions of Light Ions with Matter: Charge Exchange and Ionization.

Author: Juha Äystö
Publisher: Springer
ISBN: 9789400755543
Category : Science
Languages : fi
Pages : 0

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The IGISOL group at the University of Jyväskyla studies the properties of nuclei far off the line of beta stability. These studies are performed locally at the Jyväskylä Ion Guide Isotope Separator On-Line (IGISOL) facility, as well as at a number of other laboratories such as the ISOLDE facility in CERN, at GANIL and in Helmholzzentrum GSI, the location of the future radioactive beam facility FAIR. The group is also actively involved in work to support the development of international future facilities EURISOL and aforementioned FAIR. This book presents carefully selected papers to portrait the work at IGISOL. Previously published in the journals Hyperfine Interactions and European Physical Journal A.

Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 1351838385
Category : Technology & Engineering
Languages : en
Pages : 560

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Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Author: R Geller
Publisher: Routledge
ISBN: 135145322X
Category : Science
Languages : en
Pages : 456

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Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

Author: D. M. Mattox
Publisher: Cambridge University Press
ISBN: 0080946585
Category : Technology & Engineering
Languages : en
Pages : 947

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Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Author: Heinrich F. Beyer
Publisher: CRC Press
ISBN: 9780750304818
Category : Science
Languages : en
Pages : 361

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Emphasizing a physical understanding with many illustrations, Introduction to the Physics of Highly Charged Ions covers the major areas of x-ray radiation and elementary atomic processes occurring with highly charged ions in hot laboratory and astrophysical plasmas. Topics include light and ion sources, spectroscopy, atomic structure, magnetic and QED effects, and a thorough look at atomic collisions, from elementary processes in plasmas to ion-surface interaction and hollow atoms. Avoiding unnecessary mathematical details, this book is accessible to a broad range of readers, including graduate students and researchers.

Author: V. M. Morozov
Publisher:
ISBN:
Category : Ion accelerators
Languages : en
Pages : 10

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