Author: Hellmut Fritzsche
Publisher: World Scientific
ISBN: 981453191X
Category : Science
Languages : en
Pages : 1153
Book Description
This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.
Amorphous Silicon And Related Materials (In 2 Parts)
Author: Hellmut Fritzsche
Publisher: World Scientific
ISBN: 981453191X
Category : Science
Languages : en
Pages : 1153
Book Description
This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.
Publisher: World Scientific
ISBN: 981453191X
Category : Science
Languages : en
Pages : 1153
Book Description
This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.
Amorphous and Crystalline Silicon Carbide II
Author: Mahmud M. Rahman
Publisher: Springer
ISBN: 9783540516569
Category : Science
Languages : en
Pages : 232
Book Description
This volume contains written versions of the papers presented at the Second Inter national Conference on Amorphous and Crystalline Silicon Carbide and Related Materials (ICACSC 1988), which was held at Santa Clara University on Decem ber 15 and 16, 1988. The conference followed the First ICACSC held at Howard University, Washington DC, in December 1987 and continued to provide an in ternational forum for discussion and exchange of ideas and results covering the current status of research on SiC and related materials. ICACSC 1988 attracted 105 participants from five countries. The substantial increase in the number of papers compared with the previous year is an indication of the growing interest in this field. Of the 45 papers presented at the conference, 36 refereed manuscripts are included in this volume, while the remaining 9 appear as abstracts. The six invited papers provide detailed reviews of recent results on amorphous and crystalline silicon carbide materials and devices, as well as diamond thin films. The volume is divided into six parts, each covering an important theme of the conference.
Publisher: Springer
ISBN: 9783540516569
Category : Science
Languages : en
Pages : 232
Book Description
This volume contains written versions of the papers presented at the Second Inter national Conference on Amorphous and Crystalline Silicon Carbide and Related Materials (ICACSC 1988), which was held at Santa Clara University on Decem ber 15 and 16, 1988. The conference followed the First ICACSC held at Howard University, Washington DC, in December 1987 and continued to provide an in ternational forum for discussion and exchange of ideas and results covering the current status of research on SiC and related materials. ICACSC 1988 attracted 105 participants from five countries. The substantial increase in the number of papers compared with the previous year is an indication of the growing interest in this field. Of the 45 papers presented at the conference, 36 refereed manuscripts are included in this volume, while the remaining 9 appear as abstracts. The six invited papers provide detailed reviews of recent results on amorphous and crystalline silicon carbide materials and devices, as well as diamond thin films. The volume is divided into six parts, each covering an important theme of the conference.
Technology and Applications of Amorphous Silicon
Author: Robert A. Street
Publisher: Springer Science & Business Media
ISBN: 3662041413
Category : Technology & Engineering
Languages : en
Pages : 429
Book Description
This book gives the first systematic and complete survey of technology and application of amorphous silicon, a material with a huge potential in electronic applications. The book features contributions by world-wide leading researchers in this field.
Publisher: Springer Science & Business Media
ISBN: 3662041413
Category : Technology & Engineering
Languages : en
Pages : 429
Book Description
This book gives the first systematic and complete survey of technology and application of amorphous silicon, a material with a huge potential in electronic applications. The book features contributions by world-wide leading researchers in this field.
Photovoltaics Technical Information Guide
Amorphous Silicon and Related Materials
Author: Hellmut Fritzsche
Publisher: World Scientific
ISBN: 9789971506193
Category : Science
Languages : en
Pages : 742
Book Description
This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.
Publisher: World Scientific
ISBN: 9789971506193
Category : Science
Languages : en
Pages : 742
Book Description
This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.
Nanomaterials: Evolution and Advancement towards Therapeutic Drug Delivery (Part II)
Author: Surendra Nimesh
Publisher: Bentham Science Publishers
ISBN: 168108824X
Category : Science
Languages : en
Pages : 321
Book Description
The development of a vector for the delivery of therapeutic drugs in a controlled and targeted fashion is still a major challenge in the treatment of many diseases. The conventional application of drugs may lead to many limitations including poor distribution, limited effectiveness, lack of selectivity and dose dependent toxicity. An efficient drug delivery system can address these problems. Recent nanotechnology advancements in the biomedical field have the potential to meet these challenges in developing drug delivery systems. Nanomaterials are changing the biomedical platform in terms of disease diagnosis, treatment and prevention. Nanomaterials aided drug delivery provides an advantage by enhancing aqueous solubility that leads to improved bioavailability, increased resistance time in the body, decreased side effects by targeting drugs to the specific location, reduced dose dependent toxicity and protection of drugs from early release. In this two-part book, the contributors have compiled reports of recent studies illustrating the promising nanomaterials that can work as drug carriers which can navigate conventional physiological barriers. A detailed account of several types of nanomaterials including polymeric nanoparticles, liposomes, dendrimers, micelles, carbon nanomaterials, magnetic nanoparticles, solid lipid-based nanoparticles, silica nanomaterials and hydrogels for drug delivery is provided in separate chapters. The contributors also present a discussion on clinical aspects of ongoing research with insights towards future prospects of specific nanotechnologies. Part II covers the following topics: · Solid lipid nanoparticles and nanostructured lipid carriers · Silica based nanomaterials · Hydrogels · Metallic nanoparticles · Computational and experimental binding interactions of drug and β-cyclodextrin · Clinical milestones in nanotherapeutics · Drug delivery systems based on poly(lactide-co-glycolide) and its copolymers The book set is an informative resource for scholars who seek updates in nanomedicine with reference to nanomaterials used in drug delivery systems.
Publisher: Bentham Science Publishers
ISBN: 168108824X
Category : Science
Languages : en
Pages : 321
Book Description
The development of a vector for the delivery of therapeutic drugs in a controlled and targeted fashion is still a major challenge in the treatment of many diseases. The conventional application of drugs may lead to many limitations including poor distribution, limited effectiveness, lack of selectivity and dose dependent toxicity. An efficient drug delivery system can address these problems. Recent nanotechnology advancements in the biomedical field have the potential to meet these challenges in developing drug delivery systems. Nanomaterials are changing the biomedical platform in terms of disease diagnosis, treatment and prevention. Nanomaterials aided drug delivery provides an advantage by enhancing aqueous solubility that leads to improved bioavailability, increased resistance time in the body, decreased side effects by targeting drugs to the specific location, reduced dose dependent toxicity and protection of drugs from early release. In this two-part book, the contributors have compiled reports of recent studies illustrating the promising nanomaterials that can work as drug carriers which can navigate conventional physiological barriers. A detailed account of several types of nanomaterials including polymeric nanoparticles, liposomes, dendrimers, micelles, carbon nanomaterials, magnetic nanoparticles, solid lipid-based nanoparticles, silica nanomaterials and hydrogels for drug delivery is provided in separate chapters. The contributors also present a discussion on clinical aspects of ongoing research with insights towards future prospects of specific nanotechnologies. Part II covers the following topics: · Solid lipid nanoparticles and nanostructured lipid carriers · Silica based nanomaterials · Hydrogels · Metallic nanoparticles · Computational and experimental binding interactions of drug and β-cyclodextrin · Clinical milestones in nanotherapeutics · Drug delivery systems based on poly(lactide-co-glycolide) and its copolymers The book set is an informative resource for scholars who seek updates in nanomedicine with reference to nanomaterials used in drug delivery systems.
Silicon Molecular Beam Epitaxy
Author: E. Kasper
Publisher: CRC Press
ISBN: 1351085077
Category : Technology & Engineering
Languages : en
Pages : 306
Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Publisher: CRC Press
ISBN: 1351085077
Category : Technology & Engineering
Languages : en
Pages : 306
Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Energy Research Abstracts
Dry Etching for VLSI
Author: A.J. van Roosmalen
Publisher: Springer Science & Business Media
ISBN: 148992566X
Category : Science
Languages : en
Pages : 247
Book Description
This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Publisher: Springer Science & Business Media
ISBN: 148992566X
Category : Science
Languages : en
Pages : 247
Book Description
This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Hydrogen in Semiconductors
Author: M. Stutzmann
Publisher: Elsevier
ISBN: 0444598839
Category : Science
Languages : en
Pages : 598
Book Description
Hydrogen on semiconductor surfaces has been an area of considerable activity over the last two decades. Structural, thermal, and dynamical properties of hydrogen chemisorbed on crystalline silicon and other semiconductors have been studied in great detail. These properties serve as a reference for related, but more complex systems such as hydrogen at multiple vacancies in crystalline semiconductors or at microvoids in amorphous samples. Interesting from a surface physics point of view is the fact that hydrogen as a monovalent element is an ideal terminator for unsaturated bonds on surfaces and therefore tends to have a large influence on surface reconstruction. A related phenomenon with large technological impact (for example in low cost solar cells) is the passivation of grain boundaries in microcrystalline semiconductors. Finally, hydrogenated semiconductor surfaces always appear as a boundary layer during low-energy hydrogenation of bulk semiconductors, so that a complete description of hydrogen uptake or desorption necessarily has to take these surfaces into account. This collection of invited and contributed papers has been carefully balanced to deal with amorphous and crystalline semiconductors and surfaces and presents basic and experimental work (basic and applied) as well as theory. The resulting volume presents a summary of the state-of-the-art in the field of hydrogen in semiconductors and will hopefully stimulate future work in this area.
Publisher: Elsevier
ISBN: 0444598839
Category : Science
Languages : en
Pages : 598
Book Description
Hydrogen on semiconductor surfaces has been an area of considerable activity over the last two decades. Structural, thermal, and dynamical properties of hydrogen chemisorbed on crystalline silicon and other semiconductors have been studied in great detail. These properties serve as a reference for related, but more complex systems such as hydrogen at multiple vacancies in crystalline semiconductors or at microvoids in amorphous samples. Interesting from a surface physics point of view is the fact that hydrogen as a monovalent element is an ideal terminator for unsaturated bonds on surfaces and therefore tends to have a large influence on surface reconstruction. A related phenomenon with large technological impact (for example in low cost solar cells) is the passivation of grain boundaries in microcrystalline semiconductors. Finally, hydrogenated semiconductor surfaces always appear as a boundary layer during low-energy hydrogenation of bulk semiconductors, so that a complete description of hydrogen uptake or desorption necessarily has to take these surfaces into account. This collection of invited and contributed papers has been carefully balanced to deal with amorphous and crystalline semiconductors and surfaces and presents basic and experimental work (basic and applied) as well as theory. The resulting volume presents a summary of the state-of-the-art in the field of hydrogen in semiconductors and will hopefully stimulate future work in this area.