Author: Publisher:
ISBN:
Category : Photoresists
Languages : en
Pages : 780
Book Description
Advances in Resist Technology and Processing
Author: Advances in Resist Technology and Processing XXI
Author: Fundamental Principles of Optical Lithography
Author: Chris MackPublisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Advances in Resist Technology and Processing III
Author: Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 360
Book Description
Advances in Resist Technology and Processing II
Author: Advances in Resist Technology and Processing IV
Author: M. J. BowdenPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 384
Book Description
Novel Resists for Advanced Lithography
Author: Junyan DaiAnnual Symposium on Photomask Technology
Author: Advanced Semiconductor-on-Insulator Technology and Related Physics 15
Author: Yasuhisa OmuraPublisher: The Electrochemical Society
ISBN: 1566778662
Category : Technology & Engineering
Languages : en
Pages : 347
Book Description
This is the continuation of the long running ¿Silicon-on-Insulator Technology and Devices¿ symposium. The issue of ECS Transactions covers recent significant advances in SOI technologies, SOI-based nanoelectronics and innovative applications including scientific interests. It will be of interest to materials and device scientists, as well as to process and applications oriented engineers and scientists.
Author: