Author: Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 360
Book Description
Advances in Resist Technology and Processing III
Author: Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 360
Book Description
Advances in Resist Technology and Processing
Author: Advances in Resist Technology and Processing IV
Author: M. J. BowdenPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 384
Book Description
Proceedings of the Symposium on Patterning Science and Technology
Author: Robert GleasonPublisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 270
Book Description
MicroProcess 91
Author: Susumu NambaAdvances in Resist Technology and Processing II
Author: Advances in Resist Technology and Processing VI
Author: Elsa ReichmanisPublisher:
ISBN:
Category : Computers
Languages : en
Pages : 640
Book Description
JJAP
Author: Advances in Resist Technology and Processing XXI
Author: Polymers for Electronic & Photonic Application
Author: C. P. WongPublisher: Elsevier
ISBN: 1483289397
Category : Technology & Engineering
Languages : en
Pages : 676
Book Description
The most recent advances in the use of polymeric materials by the electronic industry can be found in Polymers for Electronic and Photonic Applications. This bookprovides in-depth coverage of photoresis for micro-lithography, microelectronic encapsulants and packaging, insulators, dielectrics for multichip packaging,electronic and photonic applications of polymeric materials, among many other topics. Intended for engineers and scientists who design, process, and manufacturemicroelectronic components, this book will also prove useful for hybrid and systems packaging managers who want to be informed of the very latest developments inthis field.* Presents most recent advances in the use of polymeric materials by the electronic industry* Contributions by foremost experts in the field