Modern Developments in X-Ray and Neutron Optics PDF Download
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Author: Alexei Erko Publisher: Springer Science & Business Media ISBN: 3540745602 Category : Technology & Engineering Languages : en Pages : 540
Book Description
This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.
Author: Alexei Erko Publisher: Springer ISBN: 3540745610 Category : Science Languages : en Pages : 541
Book Description
This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.
Author: Federico Canova Publisher: Springer ISBN: 3662474433 Category : Science Languages : en Pages : 205
Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 9780819458452 Category : Art Languages : en Pages : 1104
Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : ru Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Lahsen Assoufid Publisher: ISBN: 9781510612273 Category : Languages : en Pages : 146
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Sergey Yurish Publisher: Lulu.com ISBN: 8469794353 Category : Technology & Engineering Languages : en Pages : 484
Book Description
The Vol.1 devoted to various topics of optics and optic instrumentation, and contains 17 chapters written by 36 experts in the field from 15 countries: Brazil, China, Denmark, France, Germany, India, Japan, Mexico, Russia, Turkey, Slovenia, South Korea, UK, Ukraine and USA. 'Advances in Optics: Reviews' Book Series is a comprehensive study of the field of optics, which provides readers with the most up-to-date coverage of optics, photonics and lasers with a good balance of practical and theoretical aspects. Directed towards both physicists and engineers this Book Series is also suitable for audiences focusing on applications of optics. A clear comprehensive presentation makes these books work well as both a teaching resources and a reference books. The book is intended for researchers and scientists in physics and optics, in academia and industry, as well as postgraduate students.
Author: Alexei Erko
Author: Alexei Erko
Author: 
Author: Qiushi Huang
Author: Lahsen Assoufid
Author: Federico Canova
Author: Vivek Bakshi
Author: Lahsen Assoufid
Author: Vivek Bakshi
Author: Lahsen Assoufid
Author: Sergey Yurish