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Author: Harland G. Tompkins Publisher: Academic Press ISBN: Category : Science Languages : en Pages : 284
Book Description
Specifically designed for the user who wants expanded use of ellipsometry beyond the relatively limited number of turn-key applications, this text provides comprehensive discussion of the measurement of film thickness and optical constants in films. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films.
Author: Harland G. Tompkins Publisher: Academic Press ISBN: Category : Science Languages : en Pages : 284
Book Description
Specifically designed for the user who wants expanded use of ellipsometry beyond the relatively limited number of turn-key applications, this text provides comprehensive discussion of the measurement of film thickness and optical constants in films. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films.
Author: Harland G. Tompkins Publisher: Courier Corporation ISBN: 0486151921 Category : Technology & Engineering Languages : en Pages : 496
Book Description
This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.
Author: Harland G. Tompkins Publisher: Wiley-Interscience ISBN: 9780471181729 Category : Science Languages : en Pages : 0
Book Description
While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.
Author: Harland G. Tompkins Publisher: Momentum Press ISBN: 1606507281 Category : Technology & Engineering Languages : en Pages : 138
Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Author: Norbert G. H. Meyendorf Publisher: Springer Science & Business Media ISBN: 3662089882 Category : Science Languages : en Pages : 435
Book Description
With an emphasis on aircraft materials, this book describes techniques for the material characterization to detect and quantify degradation processes such as corrosion and fatigue. It introduces readers to these techniques based on x-ray, ultrasonic, optical and thermal principles and demonstrates the potential of the techniques for a wide variety of applications concerning aircraft materials, especially aluminum and titanium alloys. The advantages and disadvantages of various techniques are evaluated.
Author: Hiroyuki Fujiwara Publisher: John Wiley & Sons ISBN: 9780470060186 Category : Technology & Engineering Languages : en Pages : 388
Book Description
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Author: Mahmood Aliofkhazraei Publisher: Elsevier ISBN: 044463245X Category : Science Languages : en Pages : 500
Book Description
Handbook of Modern Coating Technologies: Advanced Characterization Methods reviews advanced characterization methods of modern coating technologies. The topics in this volume consist of scanning vibrating electrode technique, spectroscopic ellipsometry, advances in X-ray diffraction, neutron reflectivity, micro- and nanoprobes, fluorescence technique, stress measurement methods in thin films, micropotentiometry, and localized corrosion studies.
Author: Karsten Hinrichs Publisher: Springer ISBN: 3319758950 Category : Science Languages : en Pages : 549
Book Description
This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. Thanks to the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices, the ellipsometric analysis of optical and material properties has made tremendous strides over the past few years. The second edition has been updated to reflect the latest advances in ellipsometric methods. The new content focuses on the study of anisotropic materials, conjugated polymers, polarons, self-assembled monolayers, industrial membranes, adsorption of proteins, enzymes and RGD-peptides, as well as the correlation of ellipsometric spectra to structure and molecular interactions.
Author: Rointan Framroze Bunshah Publisher: William Andrew ISBN: 0815513372 Category : Science Languages : en Pages : 888
Book Description
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author: Rointan F. Bunshah Publisher: William Andrew ISBN: 0815517467 Category : Science Languages : en Pages : 887
Book Description
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author: Harland G. Tompkins
Author: Harland G. Tompkins
Author: Harland G. Tompkins
Author: Harland G. Tompkins
Author: Harland G. Tompkins
Author: Norbert G. H. Meyendorf
Author: Hiroyuki Fujiwara
Author: Mahmood Aliofkhazraei
Author: Karsten Hinrichs
Author: Rointan Framroze Bunshah
Author: Rointan F. Bunshah