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Author: Masataka Nisida Publisher: Springer Science & Business Media ISBN: 443168039X Category : Science Languages : en Pages : 302
Book Description
Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo elasticity in a broad sense, including, in addition to long estab lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre hensive collection of photoelastic expertises.
Author: Masataka Nisida Publisher: Springer Science & Business Media ISBN: 443168039X Category : Science Languages : en Pages : 302
Book Description
Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo elasticity in a broad sense, including, in addition to long estab lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre hensive collection of photoelastic expertises.
Author: R. B. Heywood Publisher: Elsevier ISBN: 1483151956 Category : Technology & Engineering Languages : en Pages : 462
Book Description
Photoelasticity for Designers covers the fundamental principles and techniques of photoelasticity, with an emphasis on its value as an aid to engineering design. This book is divided into 12 chapters, and begins with an introduction to the essential optical effects necessary for an understanding of the photoelastic phenomena. The next chapters describe the concept and features of polariscopes; the characterization of photoelastic materials; the formulation and testing of two-dimensional models of photoelasticity; and the application of model stresses to prototypes for the analysis of stresses occurring in the plane of the model, effectively of uniform thickness. These topics are followed by a discussion of the frozen stress technique and a comparison of the various materials that can be used for models in the technique. The ending chapters deal with the principles and application of the birefringent coating and distorted model techniques. This book will prove useful to photoelasticians, design engineers, and students.
Author: T. S. Narasimhamurty Publisher: Springer Science & Business Media ISBN: 1475700253 Category : Science Languages : en Pages : 535
Book Description
This comprehensive treatise reviews, for the first time, all the essential work over the past 160 years on the photoelastic and the closely related linear and quadratic electro-optic effects in isotropic and crystalline mate rials. Emphasis is placed on the phenomenal growth of the subject during the past decade and a half with the advent of the laser, with the use of high-frequency acousto-optic and electro-optic techniques, and with the discovery of new piezoelectric materials, all of which have offered a feedback to the wide interest in these two areas of solid-state physics. The first of these subjects, the photoelastic effect, was discovered by Sir David Brewster in 1815. He first found the effect in gels and subsequently found it in glasses and crystals. While the effect remained of academic interest for nearly a hundred years, it became of practical value when Coker and Filon applied it to measuring stresses in machine parts. With one photograph and subsequent analysis, the stress in any planar model can be determined. By taking sections of a three-dimensional model, complete three-dimensional stresses can be found. Hence this effect is widely applied in industry.
Author: Masataka Nisida
Author: Masataka Nisida
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Author: A.E.H. Love
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Author: William T. Moody
Author: V. Brcic
Author: R. B. Heywood
Author: T. S. Narasimhamurty
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Author: Florence Evelyn Harden Cozzi